Characterization of silica surfaces hydrophobized by octadecyltrichlorosilane

Flinn, Darrin Heinz; Guzonas, David; Yoon, Roe‐Hoan

doi:10.1016/0927-7757(94)80065-0

Cited by 122 publications

(99 citation statements)

References 20 publications

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“…The spectra were in good agreement with those reported for compact monolayers in the literature. 42,43 To perform a more quantitative analysis, we deconvoluted the spectra to calculate the integrated absorbance of ν as CH 2 and ν s CH 2 . 80% reduction of the ν as CH 2 and ν s CH 2 band is observed in Figure 4 after 1 h of UV irradiation in air.…”

Section: Ft-ir Results 321 Degradation Kineticsmentioning

confidence: 99%

“…43 The ν as CH 2 peak frequency is at 2927 cm -1 for liquid OTS and 2917 cm -1 for solid OTS. 43 At full monolayer coverage, the monolayer has to adopt an ordered configuration to accommodate the maximum number of molecules. The peak frequency of the SAMs we used in this particular experiment is 2920 cm -1 , indicating that the film is largely compact but contains a slight amount of disordering.…”

Section: Compactness Of Irradiated Samsmentioning

confidence: 95%

“…43 The CH 2 peak frequency is considered to be a measure of degree of ordering in SAMs. 43 The ν as CH 2 peak frequency is at 2927 cm -1 for liquid OTS and 2917 cm -1 for solid OTS.…”

Section: Compactness Of Irradiated Samsmentioning

confidence: 99%

“…43 The CH 2 peak frequency is considered to be a measure of degree of ordering in SAMs. 43 The ν as CH 2 peak frequency is at 2927 cm -1 for liquid OTS and 2917 cm -1 for solid OTS. 43 At full monolayer coverage, the monolayer has to adopt an ordered configuration to accommodate the maximum number of molecules.…”

Section: Compactness Of Irradiated Samsmentioning

confidence: 99%

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Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

McArthur

Borguet

2005

J. Phys. Chem. B

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A molecular level understanding of the photoreactivity of self-assembled monolayers (SAMs) becomes increasingly important as the spatial resolution starts to be limited by the size of the resist and the spatial extent of the photochemical reactions in photoresist micropatterning. To this end, a number of surface characterization techniques were combined to understand the reactive agents, reactive sites, kinetics, and reaction pathways in the UV photoreactivity of octadecylsiloxane (ODS) SAMs. Quantitative analysis of our results provides evidence that ground state atomic oxygen is the primary reactive agent for the UV degradation of ODS SAMs. UV degradation, which follows zero-order kinetics, results in the scission of alkyl chains instead of the siloxane headgroups. Our results suggest that the top of the ODS SAMs is the preferential reactive site. Using a novel, highly surface sensitive technique, fluorescence labeling of surface species, we identified the presence of submonolayer quantities chemical functional groups formed by the UV degradation. These groups are intermediates in a proposed mechanism based on hydrogen abstraction.

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Section: Ft-ir Results 321 Degradation Kineticsmentioning

confidence: 99%

Section: Compactness Of Irradiated Samsmentioning

confidence: 95%

“…43 The CH 2 peak frequency is considered to be a measure of degree of ordering in SAMs. 43 The ν as CH 2 peak frequency is at 2927 cm -1 for liquid OTS and 2917 cm -1 for solid OTS.…”

Section: Compactness Of Irradiated Samsmentioning

confidence: 99%

Section: Compactness Of Irradiated Samsmentioning

confidence: 99%

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Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

McArthur

Borguet

2005

J. Phys. Chem. B

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“…Bulk water on the surface of the SiO 2 wafer was then blown away with nitrogen because free water may cause undesirable polymerization to ODTS. A thin film of water that remains on the surface is thought to enhance the quality of the C 18 coating (Flinn et al, 1994;Hair and Tripp, 1995;Le Grange and Markham, 1993). Recent studies on growth mechanisms of ODTS formation on silica substrates can be found in the literature (Liu et al, 2001;Peters et al, 2002;Richter et al, 2000).…”

Section: Preparation Of Microchip With C 18 Surfacementioning

confidence: 99%

Micro‐assembly of functionalized particulate monolayer on C₁₈‐derivatized SiO₂ surfaces

Huang¹,

Geng²,

Akin³

et al. 2003

Biotech & Bioengineering

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This work describes a simple approach to immobilize functionalized colloidal microstructures onto a C 18 -coated SiO 2 substrate via specific or non-specific biomediated interactions. Biotinylated bovine serum albumin pre-adsorbed onto a C 18 surface was used to mediate the surface assembly of streptavidin-coated microbeads (2.8 µm), while a bare C 18 surface was used to immobilize anti-Listeria antibody-coated microbeads (2.8 µm) through hydrophobic interactions. For a C 18 surface pre-adsorbed with bovine serum albumin, hydrophobic polystyrene microbeads (0.8 µm) and positively charged dimethylamino microbeads (0.8 µm) were allowed to self-assemble onto the surface. A monolayer with high surface coverage was observed for both polystyrene and dimethylamino microbeads. The adsorption characteristics of Escherichia coli and Listeria monocytogenes on these microbead-based surfaces were studied using fluorescence microscopy. Both streptavidin microbeads preadsorbed with biotinylated anti-Listeria antibody and anti-Listeria antibody-coated microbeads showed specific capture of L. monocytogenes, while polystyrene and dimethylamino microbeads captured both E. coli and L. monocytogenes non-specifically. The preparation of microbead-based surfaces for the construction of microfluidic devices for separation, detection, or analysis of specific biological species is discussed.

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Thin Films, Monomolecular Layers

Ulman¹

2000

Kirk-Othmer Encyclopedia of Chemical Technology

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Molecularly engineered materials can be fabricated from the molecular level up, and their physical properties can be both predicted and designed. Surface analytical tools enable investigations of monomolecular layers in previously unprecedented detail, leading to understanding of molecular packing and ordering. These tools also provide information to aid in understanding the relationships between the structure and properties of the individual molecule as well as of the material it forms (see Surface and interface analysis). Supramolecular assemblies are fabricated by assembling molecules that interlock in a planned, hierarchical manner, forming structures having specific desired functions. There are two principal methods. Using the Langmuir-Blodgett technique, molecular layers are formed at air-water interfaces under programmed external influence. The different kinds of monolayers are superimposed in an intelligently planned sequence, forming increasingly more complex supramolecular structures. In the self-assembly technique, layers are formed spontaneously by molecules self-organizing at a solid-liquid interface, and multilayer structures are formed only after the monolayer surface has been chemically modified.

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Characterization of silica surfaces hydrophobized by octadecyltrichlorosilane

Cited by 122 publications

References 20 publications

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Micro‐assembly of functionalized particulate monolayer on C₁₈‐derivatized SiO₂ surfaces

Thin Films, Monomolecular Layers

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Characterization of silica surfaces hydrophobized by octadecyltrichlorosilane

Cited by 122 publications

References 20 publications

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Micro‐assembly of functionalized particulate monolayer on C18‐derivatized SiO2 surfaces

Thin Films, Monomolecular Layers

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Micro‐assembly of functionalized particulate monolayer on C₁₈‐derivatized SiO₂ surfaces