2019
DOI: 10.1016/j.surfcoat.2019.07.071
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Characterization of surface modification mechanisms for boron nitride films under plasma exposure

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Cited by 7 publications
(1 citation statement)
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“…64) Recently, the modification of the surface properties of c-BN films prepared by this system was investigated. 65,66) It was demonstrated that the c-BN films exhibited superior anti-erosion property against plasma exposure. Matsuda et al reported 67) an improved RePAC system for a Si wafer process, where E ion was controlled by an applied RF bias voltage (with a frequency of 400 kHz) and Γ ion by I A supplied from a filament.…”
Section: Introductionmentioning
confidence: 99%
“…64) Recently, the modification of the surface properties of c-BN films prepared by this system was investigated. 65,66) It was demonstrated that the c-BN films exhibited superior anti-erosion property against plasma exposure. Matsuda et al reported 67) an improved RePAC system for a Si wafer process, where E ion was controlled by an applied RF bias voltage (with a frequency of 400 kHz) and Γ ion by I A supplied from a filament.…”
Section: Introductionmentioning
confidence: 99%