2011 IEEE 61st Electronic Components and Technology Conference (ECTC) 2011
DOI: 10.1109/ectc.2011.5898612
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Characterization of the thermal impact of Cu-Cu bonds achieved using TSVs on hot spot dissipation in 3D stacked ICs

Abstract: 3D-IC stacking is a promising technique for miniaturization and performance enhancement of electronic systems. The complexity of the interconnect structures, combined with the reduced thermal spreading in the thinned dies used for the stacking and the poorly thermally conductive adhesives adopted for bonding the dies in the stack complicate the modeling of the thermal behavior of 3D ICs. The same amount of energy dissipation will lead to higher temperatures and a more pronounced temperature peak in a stacked d… Show more

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Cited by 16 publications
(6 citation statements)
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References 20 publications
(24 reference statements)
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“…It is important to recall that due to aspect ratio limitations, high-density TSVs interconnections require aggressively thinned silicon wafers. Simulation and experimental results in [7] indicate that the hotspot temperature on a 25µm thick die in the 3D stack is approximately 2x higher compared to a 2D reference case. Fig.…”
Section: B Die Thicknessmentioning
confidence: 93%
“…It is important to recall that due to aspect ratio limitations, high-density TSVs interconnections require aggressively thinned silicon wafers. Simulation and experimental results in [7] indicate that the hotspot temperature on a 25µm thick die in the 3D stack is approximately 2x higher compared to a 2D reference case. Fig.…”
Section: B Die Thicknessmentioning
confidence: 93%
“…Fig.2. Cross-section of direct Cu-Cu bonding [10] (left) and microbump [7] (right) die-die interface.…”
Section: Introductionmentioning
confidence: 99%
“…This paper focuses on the thermal characterization of the underfill materials used in combination with microbumps. In [10] the thermal impact of a die -die interface with Cu-Cu bonds is studied. In that case the thickness of the die -die interface is typically in the order of several hundreds of nm to 1µm.…”
Section: Introductionmentioning
confidence: 99%
“…To enhance the integrated circuit performance besides of 2 dimensional scaling 3D chip and wafer stacking technology with through silicon via (TSV) is intensely developed around the world, which will enable the large transferring signal bandwidth, the low power consumption, the small form factor and so on [1][2]. Low resistant electrical interconnection between the chips is very important, which mainly depends on the conductivity of interconnecting material and dimensions.…”
Section: Introductionmentioning
confidence: 99%