2014 International Conference on Devices, Circuits and Communications (ICDCCom) 2014
DOI: 10.1109/icdccom.2014.7024703
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Characterization of TiO2 Thin Film Deposited by RF Sputtering Method

Abstract: The present work involves the study of crystalline structure and surface morphology of Titanium Dioxide (TiO 2 ) thin film deposited by RF magnetron sputtering. TiO 2 thin film was grown on ITO coated glass substrate using Ti metal target. The XRD results revealed the crystalline structure and indicated that the deposited film had the intensities of metastable anatase phase. The surface morphology and its roughness values suggest that the film had smooth surface and densely packed with grains.

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“…The Pt(10 nm)/TiO2(4 nm)/Pt(10 nm) exponential selector was fabricated with a twostep lithography process as shown in The TiO2 film has several polymorphs, such as rutile, anatase and brookite phases [190][191][192][193]. Rutile is the most stable phase of TiO2, whereas anatase and brookite are both metastable states [194,195].…”
Section: Characterization Of Pt/tio2/pt Exponential Selectorsmentioning
confidence: 99%
“…The Pt(10 nm)/TiO2(4 nm)/Pt(10 nm) exponential selector was fabricated with a twostep lithography process as shown in The TiO2 film has several polymorphs, such as rutile, anatase and brookite phases [190][191][192][193]. Rutile is the most stable phase of TiO2, whereas anatase and brookite are both metastable states [194,195].…”
Section: Characterization Of Pt/tio2/pt Exponential Selectorsmentioning
confidence: 99%