2010
DOI: 10.1016/j.microrel.2010.04.005
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Charge-based model for symmetric double-gate MOSFETs with inclusion of channel doping effect

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Cited by 10 publications
(5 citation statements)
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“…To simplify the obtained formulae the constant mobility in the Sallese model was replaced with voltage dependent effective mobility using the same mobility models as before but replacing the position dependent mobile charge with an effective value. The simplified models were then compared with their more accurate counterparts indicating a very good agreement in the case of mobility model (8) and thus validating the proposed description of effective mobility.…”
Section: Discussionmentioning
confidence: 68%
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“…To simplify the obtained formulae the constant mobility in the Sallese model was replaced with voltage dependent effective mobility using the same mobility models as before but replacing the position dependent mobile charge with an effective value. The simplified models were then compared with their more accurate counterparts indicating a very good agreement in the case of mobility model (8) and thus validating the proposed description of effective mobility.…”
Section: Discussionmentioning
confidence: 68%
“…Moreover, a very good agreement between the modified 'model 1' and its simplified version is obtained in the case of both current and transconductance over a wide range of the applied voltages. This indicates that mobility model (8) with effective mobile charge calculated according to (17) is a good approximation of effective mobility.…”
Section: Resultsmentioning
confidence: 73%
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“…One of the parameters that improves the short-channel effects and controls the threshold voltage is the channel-doping concentration; for this reason, researchers often apply channel doping of a uniform concentration to control the short-channel effects in MOSFETs [15][16][17][18]; moreover, it must be noted that the nature of the actual in-practice transistor-channel doping profile becomes closer to that of the Gaussian profile due to the ion-implantation stages that are required during the fabrication process [19][20][21]. For this article, the Gaussian-channel doping profile that is used to control the short-channel effects in the DG MOSFET are therefore investigated with the use of a twodimensional (2D) quantum simulation, whereby the MOSFETchannel length is 9 nm and the MOSFET-channel thickness is 3 nm.…”
Section: Introductionmentioning
confidence: 99%
“…Researchers have solved the 1-D Poisson equation to derive analytical expressions for the channel potential, threshold voltage and current (Lo et al, 2007;Shih and Wang, 2009). Researchers have also paid their attention to propose analytical expressions of threshold voltage and the current using charge-based approach (Zhang et al, 2010;Jazaeri et al, 2018) on the cost of nonphysical approximations which compromise the physical behavior of the device. He et al (2007) and Liu et al (2008) have proposed analytical models of the surface potential, threshold voltage and current using carrier-based approach for symmetric undoped DG MOSFET.…”
mentioning
confidence: 99%