Chemical inertness of Ta–Si–N coatings in glass molding

Bonding Characteristics and Chemical Inertness of Zr–Si–N Coatings with a High Si Content in Glass Molding

“…The structure varied from Cemented carbide is a representative die material for glass molding. A Ti interlayer of 100 nm was inserted to fabricate the Zr-Si-N/Ti/WC assembly, which prevented buckle formation during repeated thermal cycle annealing [21]. The Zr 22 Si 30 N 48 (0.4,R5) process was conducted again to fabricate a Zr 22 Si 29 N 49 /Ti/WC assembly; this assembly exhibited a surface roughness of 1.5 nm in the as-deposited state, which was higher than those of the Zr-Si-N(0.4,R5) coatings prepared on Si wafers.…”

“…The inner positions of the coatings indicated the area contacted SiO 2 -B 2 O 3 -BaO-based glass plates during thermal cycle annealing. The chemical inertness of the coatings against glass was evaluated by the presence of surface damage, such as scraps or dips [10], and flaked or island oxides [21], which consecutively result in roughness variation. The surface roughness variations on the outer positions indicated the thermal stability of the coatings during the glass molding process.…”

“…Therefore, the requirements of protective coatings are high hardness, smooth surface morphology, high thermal stability, adequate adhesion, long cyclability, and chemical inertness. Following the successful utilization of noble metal alloys [4][5][6][7][8][9][10][11] and carbon films [12,13], transition metal nitride films [14][15][16][17][18][19][20][21][22][23], which offer cost reduction and process control benefits, have become candidates for protective coatings. The oxidation resistance levels of some transition metal nitrides have been improved by the introduction of Si; in particular, improvements to Ti-Si-N [24][25][26] and Zr-Si-N [27][28][29] coatings have been reported.…”

Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering

“…We reported the preparation of understoichiometric Ta The vital characteristics of the protective coatings on glass molding dies were high hardness, low surface roughness, and chemical inertness against moldable optical glasses [6,8,32,33]. The formation of amorphous surface oxide scales on high-Ta-content Ta-Zr-N thin films restricted the increase in surface roughness relative to that of crystalline oxide scales formed on high-Zr-content Ta 0.33 Zr 0.67 N 0.68 thin films (Table 3).…”

Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering

“…In our previous studies on Ta-Si-N [12], Nb-Si-N [13] and Zr-Si-N [14] coatings, fabricated using direct-current magnetron sputtering (DCMS) (introducing high Si contents into nitrides), formed an amorphous structure on X-ray and improved the oxidation resistance; although their mechanical properties deteriorated. Therefore, high-Si-content Ta-Si-N [15] and Zr-Si-N [16] coatings are applied for glass molding dies, which are operated under a low oxygen-containing atmosphere at approximately 600 • C. By contrast, the low-Si-content Zr-Si-N coatings exhibited a crystalline structure accompanied with a hardness level of 23-24 GPa and a compressive stress of less than 2 GPa [14]. High-power impulse magnetron sputtering (HiPIMS) [17,18] was recommended to grow films with a dense structure, high hardness and high residual compressive stress [19,20].…”