2014
DOI: 10.1134/s1063782614020109
|View full text |Cite
|
Sign up to set email alerts
|

Chemical vapor deposition of isolated spherical diamond particles with embedded silicon-vacancy color centers onto the surface of synthetic opal

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
10
0

Year Published

2014
2014
2022
2022

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 15 publications
(10 citation statements)
references
References 36 publications
0
10
0
Order By: Relevance
“…It is known that the ZPL of the SiV center in diamond films and particles has a high intensity, regardless of the methods of gas-phase synthesis used, silicon doping methods and substrate materials [32][33][34][35]. This is due to the smaller size of the Si atom compared to the Ge atom, as a result of which it is more efficiently embedded in the diamond lattice to form an optically active center and is present in CVD diamond structures even at low content in the gas phase.…”
Section: Resultsmentioning
confidence: 99%
“…It is known that the ZPL of the SiV center in diamond films and particles has a high intensity, regardless of the methods of gas-phase synthesis used, silicon doping methods and substrate materials [32][33][34][35]. This is due to the smaller size of the Si atom compared to the Ge atom, as a result of which it is more efficiently embedded in the diamond lattice to form an optically active center and is present in CVD diamond structures even at low content in the gas phase.…”
Section: Resultsmentioning
confidence: 99%
“…The broadband luminescence peaking at ≈ 600 nm is attributed to structural defects connected with the presence of amorphous sp 2 hybridized carbon [27,28]. For the Mo substrate, the broadband luminescence is well pronounced and the most intensive relative to ZPL one (2.5 for intensity ratio and 0.15 for integral intensity ratio).…”
Section: Photoluminescencementioning
confidence: 91%
“…The SiV − and GeV − centers have a very similar electronic level structure with D 3d symmetry [ 12 ]. Both negatively charged silicon-vacancy (SiV − ) and germanium-vacancy (GeV − ) centers can be formed with several techniques: ion implantation [ 13 , 14 ], shock wave synthesis, and doping during HPHT [ 15 , 16 ] and chemical vapor deposition (CVD) growth [ 17 , 18 , 19 , 20 ]. Among these methods, the CVD approaches look most attractive, since the ion implantation often results in lattice damage, causing strains and the degradation of optical properties.…”
Section: Introductionmentioning
confidence: 99%