2020
DOI: 10.1039/d0nr00302f
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Chemical vapour deposition of graphene on copper–nickel alloys: the simulation of a thermodynamic and kinetic approach

Abstract:

The thermodynamic simulation shows that the deposition driving force is greatest for high carbon to hydrogen ratios and reaches a maximum around 850 °C.

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Cited by 19 publications
(10 citation statements)
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“…In the same vein, Dong et al [80] investigated the growth of Graphene by plasma improved CVD at a low temperature (600 °C). The Ni-Cu alloy was chosen to work on the homogeneity and nature of graphene.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%
“…In the same vein, Dong et al [80] investigated the growth of Graphene by plasma improved CVD at a low temperature (600 °C). The Ni-Cu alloy was chosen to work on the homogeneity and nature of graphene.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%
“…In addition to a single metallic catalyst, Ni-Cu foam alloys were also employed to grow graphene foams with a controlled number of layers [ 18 , 32 , 33 , 34 ]. Starting from commercial nickel foam by melting and diffusion of the Cu film, they obtained Ni-Cu alloys that allowed them to control the number of graphene layers.…”
Section: Synthesis and Processing Approach Using Chemical Vapor Depos...mentioning
confidence: 99%
“…For example, graphene production by exfoliation using tannic acid in an aqueous medium has been developed with an efficient methodology . However, chemical vapor deposition (CVD) remains the most efficient method for mass production by employing roll-to-roll processing. , CVD allows some control of both graphene quality and thickness through growth kinetics and thermodynamics. …”
Section: Introductionmentioning
confidence: 99%