2018
DOI: 10.1016/j.mssp.2018.07.020
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CIGS thin film and device performance produced through a variation Ga concentration during three-stage growth process

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Cited by 11 publications
(2 citation statements)
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“…This deep trap level can act as an active recombination center, resulting in an increased rate of charge recombination at the interface of CISSe/CdTe or grain boundary, and a broadening of the band gap of CISSe, which negatively impacts the solar cell device performance [60]. On the other hand, the substitutional configuration of Sb S and Sb Se defects leads to the activation of shallow donor traps, presumably due to a deficiency of anion atoms [61][62][63][64]. The trap level of unoccupied spin-down states for Sb S and Sb Se defects is located at 58 meV and 107 meV below the conduction band, respectively.…”
Section: Electronic Structurementioning
confidence: 99%
“…This deep trap level can act as an active recombination center, resulting in an increased rate of charge recombination at the interface of CISSe/CdTe or grain boundary, and a broadening of the band gap of CISSe, which negatively impacts the solar cell device performance [60]. On the other hand, the substitutional configuration of Sb S and Sb Se defects leads to the activation of shallow donor traps, presumably due to a deficiency of anion atoms [61][62][63][64]. The trap level of unoccupied spin-down states for Sb S and Sb Se defects is located at 58 meV and 107 meV below the conduction band, respectively.…”
Section: Electronic Structurementioning
confidence: 99%
“…CIGS films with broad single-phase composition range and tunable bandgaps have attracted considerable attention as light absorbers for highly efficient photovoltaic devices [1][2][3]. Various vacuum processes are generally utilized to fabricate CIGS films, including co-evaporation processes and two-step fabrication processes that involve sputtering precursor and post-selenization reaction [4][5][6]. The efficiency of CIGS solar cells fabricated via co-evaporation method exceeds 20% [7].…”
Section: Introductionmentioning
confidence: 99%