Closure to “Discussion of ‘Electrodeposition of Silicon onto Graphite’ [G. M. Rao, D. Elwell, and R. S. Feigelson (pp. 1708–1711, Vol. 128, No. 8)]”

Rao, Gopalakrishna M.; Elwell, D.; Feigelson, Robert S.

doi:10.1149/1.2123697

Cited by 44 publications

(59 citation statements)

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“…Silicon electrodeposition on a substrate has been reported by using Si-containing organic solutions [258,259], ILs [260,261], and molten salts [262][263][264]. Thus, semiconductor QDs can also be formed if the substrate in the electrodepositon system were replaced by a gaseous plasma.…”

Section: Semiconductorsmentioning

confidence: 99%

A review of plasma–liquid interactions for nanomaterial synthesis

Chen¹,

Li²,

Li³

2015

J. Phys. D: Appl. Phys.

312

225

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Over the past decades, a new branch of plasma research, the nanomaterial (NM) synthesis by plasma-liquid interactions (PLIs), is rapidly rising, mainly due to the recently developed various plasma sources operated from low to atmospheric pressures. The PLIs provide novel plasma-liquid interfaces where many physical and chemical processes take place. By exploiting these physical and chemical processes, various NMs ranging from noble metal nanoparticles to graphene nanosheets can be easily synthesized. The currently rapid development and increasingly wide utilization of the PLI method naturally lead to an urgent requirement for presenting a general review. This paper reviews the current status of research on plasma-liquid 2 interactions for nanomaterial syntheses. Focus is on the comprehensive understanding of the synthesis process and perceptive opinions on the present issues and future challenges in this subject.

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Section: Semiconductorsmentioning

confidence: 99%

A review of plasma–liquid interactions for nanomaterial synthesis

Chen¹,

Li²,

Li³

2015

J. Phys. D: Appl. Phys.

312

225

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“…The above relationships are valid only when the gas is ideal, and the evaporation is fast enough to reach equilibrium. The validity of these conditions was confirmed by flowing Ar gas (20 4 into molten KF-KCl.-In our previous study, K 2 SiF 6 concentrations of 2.0-3.5 mol% and current densities of 50-200 mA cm −2 at 923 K were determined to be the optimum conditions for the electrodeposition of adherent, compact, and smooth Si layers in molten KF-KCl-K 2 SiF 6 .…”

Section: Resultsmentioning

confidence: 84%

“…In previous studies, a compact and smooth Si layer was electrodeposited in pure fluoride molten salts. [20][21][22] Thus, the high ratio of Cl − ions in the present experiment is likely to cause the observed granular morphology. The influence of the anionic fraction on the morphology of Si deposit will be investigated in the future.…”

Section: Injection Of Siclmentioning

confidence: 72%

“…[1][2][3][4][5][6][7][8][9][10] The use of fluoride-based molten salts, such as LiF-KF and LiF-NaF-KF, is effective for obtaining compact and smooth Si films. 1,2,5,9,10 However, previous investigations that employed fluoride-based molten salts found that the low solubility of LiF and NaF in water makes the removal of the salt that adheres to the deposited Si a major problem. 10,11 Another essential problem is the lack of high-purity and low-cost Si sources, on which the process previously studied was based.…”

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confidence: 99%

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Editors' Choice—Silicon Electrodeposition in a Water-Soluble KF–KCl Molten Salt: Utilization of SiCl₄as Si Source

Yasuda

Maeda

Hagiwara

et al. 2016

J. Electrochem. Soc.

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The electrodeposition of Si was investigated in a molten KF–KCl salt mixture (eutectic composition, 45:55 mol%) after the introduction of SiCl4 to demonstrate a new production method for solar cell substrates. Gaseous SiCl4 was introduced directly into the molten salt at 1023 K by a vapor transport method using Ar as a carrier gas. The dissolution efficiency of SiCl4 exceeded 80% even when a simple tube was used for bubbling. Galvanostatic electrolysis was conducted at 923 K on a Ag substrate at 155 mA cm−2 for 20 min in the molten KF–KCl salt mixture after the dissolution of 2.30 mol% SiCl4. Although a compact Si layer was formed, its smoothness was inferior to that obtained from the melt after the addition of K2SiF6. The molar fraction of the fluoride anion is suggested as one of the factors affecting the morphology of the deposits.

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“…The reactions decrease the theoretical decomposition potential to À0.73 and À0.57 V for CO 2 and CO release, respectively. [11] The experimentally measured deposition potentials [12][13][14][15][16][17][18][19][20] are considerably different from these calculated values. For example, the decomposition potential on graphite cathode has been reported between À0.80 and À1 V, [12][13][14][15][16][17][18][19][20] which is approximately 0.25 V larger than the predicted potential.…”

mentioning

confidence: 99%

Determination of Cell Potential for Silicon Electrodeposition

Sokhanvaran

Danaei

Barati

2014

Metallurgical and Materials Transactions E

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Electrowinning of Si from cryolite-based melts is a possible solution for mass production of high purity silicon. The required cell potential to deposit Si on a cathode of interest, copper, is fundamental information that needs to be measured for controlling the co-deposition of impurities. In this study, the potential was measured using cyclic voltammetry in a cryolite-6 pct SiO 2 melt. The deposited Si on copper forms a Cu-Si alloy in which the activity of Si affects the decomposition potential. The measurements were carried out in a range of Si concentrations, allowing the prediction of potential change during the actual deposition process, where the Si content changes constantly. The results were compared with the values obtained from cyclic voltammetry on an inert electrode, graphite, to investigate if the formation of Cu-Si alloy is responsible for decreasing the potential.

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Closure to “Discussion of ‘Electrodeposition of Silicon onto Graphite’ [G. M. Rao, D. Elwell, and R. S. Feigelson (pp. 1708–1711, Vol. 128, No. 8)]”

Abstract: not Available.

Cited by 44 publications

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A review of plasma–liquid interactions for nanomaterial synthesis

A review of plasma–liquid interactions for nanomaterial synthesis

Editors' Choice—Silicon Electrodeposition in a Water-Soluble KF–KCl Molten Salt: Utilization of SiCl₄as Si Source

Determination of Cell Potential for Silicon Electrodeposition

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Closure to “Discussion of ‘Electrodeposition of Silicon onto Graphite’ [G. M. Rao, D. Elwell, and R. S. Feigelson (pp. 1708–1711, Vol. 128, No. 8)]”

Abstract: not Available.

Cited by 44 publications

References 0 publications

A review of plasma–liquid interactions for nanomaterial synthesis

A review of plasma–liquid interactions for nanomaterial synthesis

Editors' Choice—Silicon Electrodeposition in a Water-Soluble KF–KCl Molten Salt: Utilization of SiCl4as Si Source

Determination of Cell Potential for Silicon Electrodeposition

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Product

Resources

About

Editors' Choice—Silicon Electrodeposition in a Water-Soluble KF–KCl Molten Salt: Utilization of SiCl₄as Si Source