The selection of the title includes designing of SRAM cell using CNTFET because CNTFET overcomes all the issues coming from CMOS technology beyond the 10nm technology node. With the reduction in channel length, the threshold voltage required for CMOS-based technology increases, and the corresponding off-state current decreases. This can prove to be a significant advancement for the semiconductor industry. With the evolution of the new generation of the technology era, especially beyond 10nm, CMOS is not able to fulfil all the required conditions, as beyond 10nm technology node, threshold voltage decreases, and consequently off-state current and leakage power increase. This is the reason that CNTFET can be considered a prominent replacement of CMOS transistor for the designing of SRAM cells with the technology node beyond 10nm. This designed SRAM cell is applicable for IoT applications because IoT uses a microcontroller and the SRAM cell is used as a data memory in the microcontroller. A Data memory always requires high speed, ultra-low power dissipation, and high stability from the cell. Thus, to fulfil this requirement, performance analysis to identify the problem statement of conventional cells and then to improve their performance based on the findings is essential. This is the reason that the 7T CNTFET-based SRAM novel cell is introduced, and its performance is going to be further improved so that the designed novel cell becomes compatible with IoT applications. Leakage power and stability factor are the main performance parameters to improve of SRAM cells.