Colored semi-transparent Cu-Si oxide thin films prepared by magnetron sputtering

Abstract

Colored semi-transparent Cu-Si oxide thin films have been prepared by reactive magnetron sputtering from a single cathode of coppersilicon composition. Thin films of different composition and optical response were obtained by changing process parameters like the relative amount of copper in the target and the O 2 /Ar mixture of the reactive plasma gas. The film characteristics were analyzed by several techniques. Their optical properties (refractive index, absorption coefficient, color) have been correlated with the process parameters used in the film preparation as well as with the film stoichiometry and chemistry.

Hybrid co-deposition of mixed-valent molybdenum–germanium oxides (MoxGeyOz): A route to tunable optical transmission

“…13 multi-component oxide coatings deposited at room temperature has also been reported by GilRostra et al for a variety of mixed-valent films [15,[17][18][19].…”

“…While most of these applications require fully stoichiometric, transparent oxide mixtures, recent works exploring sub-stoichiometric oxide systems have generated interest due to their unique absorptive properties [15][16][17]. Specifically, studies by GilRostra et al [15,[17][18][19] have utilized reactive magnetron sputtering to tailor the visible absorption of substoichiometric transition metal oxides, including Ni [15], Co [15,19], Fe [15], Cu [15,18], W [15,17], and Mo [15], within a dielectric silicon dioxide matrix. Gil-Rostra et al…”

“…Methods used for depositing mixed oxides include the use of alloyed targets [41][42][43][44][45], affixing strips of various materials to the target surface [15,[17][18][19], and co-deposition using multiple sources [46][47][48][49]. While each of these methods is capable of depositing uniform, high quality thin films, co-deposition was selected for use within this study.…”

Microstructure of mixed oxide thin films prepared by magnetron sputtering at oblique angles

“…Similar interpretation has been adopted for the other series of mixed oxide thin film samples [17,19,22,23]. The initial VF for pure SiO 2 is about 15% [18].…”

“…It was found that the film stoichiometry depends on the number of metal stripes wrapped to the Si target. The correlation between metal stripes in the target and thin film stoichiometry has been reported elsewhere [17,19]. [14][15][16].…”