Electroplating is an emerging technique for the production of
microsystems. This is due to advantages such as high rate of deposition, high
resolution, high shape fidelity, simple scalability, and good compatibility with
existing processes in microelectronics. Materials ranging from high-conductivity
metals over soldering connections to ferromagnets can be deposited. In this
paper the basics of electroplating are reviewed and examples of recent
applications of electroplating in the processing of microsystems are presented.