Advances in Manufacturing Technology 2022
DOI: 10.1201/9781003203681-18
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Comparative Analysis of OFET for Low-Power Flexible Electronic Devices Manufacturing

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“…TFET shows low I ON that can be controlled by many methods like dual metal gate, triple metal gate, tunneling junction with two materials, dual metal gate and many others. [9][10][11][12][13][14][15] To increase the device density nanowire structures are mostly preferred. Today NW-TFETs are in demand because of its latest density, good electrostatic control on the channel, less SS.…”
mentioning
confidence: 99%
“…TFET shows low I ON that can be controlled by many methods like dual metal gate, triple metal gate, tunneling junction with two materials, dual metal gate and many others. [9][10][11][12][13][14][15] To increase the device density nanowire structures are mostly preferred. Today NW-TFETs are in demand because of its latest density, good electrostatic control on the channel, less SS.…”
mentioning
confidence: 99%