Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods

Bodermann, Bernd; Mirandé, W.; Kerwien, Norbert; Tavrov, Alexander V.; Totzeck, Michael; Tiziani, Hans J.

doi:10.1117/12.509713

Cited by 2 publications

(4 citation statements)

References 7 publications

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“…The measurements scheme is depicted in figure 9. A detailed description of AGID microscopy has been published elsewhere [19][20][21]. This method theoretically provides CD measurements with a better CD-linearity as bright field microscopy [20].…”

Section: Alternating Grazing Incidence Dark Field Microscopymentioning

confidence: 99%

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Calibration procedures and application of the PTB photomask CD standard

et al. 2005

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The PTB has developed a new 6025 photomask standard for calibration of CD metrology tools in a joint project with partners from mask industry in Germany [1]. We report on the design of the standard, its calibration procedures and the results of recent round robin measurements on this standard in which different CD metrology tools of the project partners were involved.The layout of the CD photomask standard (COG and 193 nm halftone PSM) contains isolated as well as dense features in both tones with nominal CD down to 100 nm. Calibration of the standards was performed at PTB by UV microscopy and LV-SEM, supported by additional AFM measurements for edge slope characterization. For analysis of UV microscopy as well as SEM images appropriate signal modeling was applied, which allowed to extract the feature widths at the top of the structures as well as the widths at 50% height of the structures.In this contribution we will also discuss results of a recent round robin comparison measurement performed on up-todate metrology tools available for CD metrology today by means of one of the newly developed CD standards. We used PTB calibrated CD standards in order to provide a set of CD references for the different tools which then should be used in a "blind" comparison to calibrate an unknown CD mask of the same design as the standards. Different type of CD metrology instrumentation, namely standard UV and DUV optical as well as DUV water immersion CD microscopes, a new UV dark field optical microscope, CD-SEM, and AFM/SFM were applied. The outcome of this comparison on currently applied metrology instrumentation provides a valuable source of information for cross calibration issues which are discussed in mask industry today.

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Section: Alternating Grazing Incidence Dark Field Microscopymentioning

confidence: 99%

“…The simulations have been performed using MICROSIM and the RCWA method. Due to the light-edge interaction characteristics AGID microscopy is more applicable for measurements of the top CD than for the mean CD [21]. …”

Section: Alternating Grazing Incidence Dark Field Microscopymentioning

confidence: 99%

Calibration procedures and application of the PTB photomask CD standard

et al. 2005

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“…By illuminating the specimen successively from opposite sides of the structure, the edge positions can be detected independently and the difference of both positions yields the linewidth of the structure. Thus, AGID microscopy shows much reduced proximity effects, better edge localisation and an improved resolving power as compared with conventional dark-field or bright-field microscopy [22][23][24].…”

Section: Agid Microscopymentioning

confidence: 99%

“…At Physikalisch-Technische Bundesanstalt (PTB) we have developed another microscopy method, alternating grazing incidence dark-field microscopy (AGID), which enables accurate quantitative CD measurements on isolated line structures even in the subdiffraction regime [22][23][24]. AGID microscopy is also no super-resolution method.…”

Section: Introductionmentioning

confidence: 99%

Optical dimensional metrology at Physikalisch-Technische Bundesanstalt (PTB) on deep sub-wavelength nanostructured surfaces

Bodermann

Ehret

Endres

et al. 2016

Surf. Topogr.: Metrol. Prop.

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The dark-field microscopy method with alternating grazing incidence UV illumination (UV-AGID) developed at Physikalisch-Technische Bundesanstalt offers the possibility of measuring individual isolated line structures with linewidths down to the sub-wavelength regime. In contrast, scatterometry is able and already widely used to measure average dimensional parameters of periodic structures down to the deep sub-wavelength regime. Both methods can be used for dimensional measurements of micro-and nanostructures, in particular the critical dimensions (CDs) on wafers or photomasks in the semiconductor industry, complementing each other favourably. Based on numerical simulations, we have investigated the ultimate limits of these two methods in the deep sub-wavelength regime. It has been shown that AGID microscopy in the DUV spectral range is in principle capable of measuring line structures with CDs down to a few 10 nm, depending on the structure material. For scatterometry, no fundamental limit has been observed. In practice, a technical limit due to the limited signal-tonoise ratio is expected for CDs of a few nm in width. RECEIVED

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Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods

Cited by 2 publications

References 7 publications

Calibration procedures and application of the PTB photomask CD standard

Calibration procedures and application of the PTB photomask CD standard

Optical dimensional metrology at Physikalisch-Technische Bundesanstalt (PTB) on deep sub-wavelength nanostructured surfaces

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