2017 4th International Conference on Advances in Electrical Engineering (ICAEE) 2017
DOI: 10.1109/icaee.2017.8255323
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Comparative study of full adder circuit with 32nm MOSFET, DG-FinFET and CNTFET

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Cited by 5 publications
(3 citation statements)
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“…These effects encompass short channel phenomena, increased leakage current, drain induced barrier lowering, and concerns related to device reliability, all of which collectively compromise the overall performance of the device [13][14][15]. The limitations associated with attempting to scale down traditional semiconductor devices have led researchers to look into the following possible solutions [16][17][18]:…”
Section: Metal-oxide Semiconductor Field Effect Transistormentioning
confidence: 99%
“…These effects encompass short channel phenomena, increased leakage current, drain induced barrier lowering, and concerns related to device reliability, all of which collectively compromise the overall performance of the device [13][14][15]. The limitations associated with attempting to scale down traditional semiconductor devices have led researchers to look into the following possible solutions [16][17][18]:…”
Section: Metal-oxide Semiconductor Field Effect Transistormentioning
confidence: 99%
“…The charge at the inception of the channel is almost autonomous of the drain voltage when the gate capacitance is greater than quantum. Semiconducting CNTs were used to fabricate CNTFETs that show promise over silicon based MOSFETs due to their superior electrical characteristics [6] [7].…”
Section: Carbon Nano Tube Field Effect Transistormentioning
confidence: 99%
“…Primarily, the MOSFET logic circuits are constructed based on a generic Process Design Kit using 32nm Predictive Technology Model (PTM) with 32nm as Physical Channel Length, 1.5nm as thickness of high-k top gate dielectric material (Tox) and 0.35eV as Fermi level of the doped S/D (Efo). Then, the CNTFET PTM circuit models as shown in Table 1 [6] that consist of device modelling implemented in HSPICE circuit simulator [7] are being compared to the MOSFET designs.…”
Section: Carbon Nano Tube Field Effect Transistormentioning
confidence: 99%