Comparison Between Performances of In2O3 and In2TiO5-Based EIS Biosensors Using Post Plasma CF4 Treatment Applied in Glucose and Urea Sensing

Abstract

In this study, the effect of post-deposition tetrafluoromethane (CF 4 ) plasma treatment on the physical and electrical characteristics of an In 2 TiO 5 based electrolyte-insulator-semiconductor (EIS) sensor was investigated. Post-deposition CF 4 plasma treatment typically improved the crystalline structure and repaired dangling bonds at the grain boundaries. We used the newly fabricated device to detect several ions, such as sodium and potassium, which are essential for many biological processes. The as-deposited and CF 4 plasma treated In 2 TiO 5 sensing window with an EIS structure was also able to detect the pH of a solution, different alkali ions (Na + and K + ), glucose, and urea. The sensing membrane after a 60-sec CF 4 plasma treatment displayed improved biosensing characteristics, such as higher sensitivity (59.64 mV/pH), better drift rate, and a smaller hysteresis voltage of approximately 0.424 mV/h. The In 2 TiO 5 sensing membrane treated with CF 4 plasma is a promising material for use in EIS biosensing applications.

Fabrication and Characterization of In0.9Ga0.1O EGFET pH Sensors

“…The surface potential voltage (ϕ) of the In 0.9 Ga 0.1 O EGFET pH sensors between In 0.9 Ga 0.1 O membrane and pH buffer solutions can be expressed as the following equation by the site-binding model and double layer theory [24,30]:…”

NH3 Plasma-Treated Magnesium Doped Zinc Oxide in Biomedical Sensors with Electrolyte–Insulator–Semiconductor (EIS) Structure for Urea and Glucose Applications

“…In contrast, the samples treated for 1 min and 6 min had a large hysteresis voltage. This indicates highly dense crystal defects that create interior sites that can respond to changes in the chemical composition of the tested solution, which in turn results in large gate voltage variations [34,35]. For long-term reliability, the drift effect of the ZO and MZO sensing film was measured, using the C-V curve, in a pH 7 buffer solution, for 720 min, as shown in Figure 6c,d.…”

“…the bio-sensing parameters, such as the urea and glucose sensing sensitivity, for different EIS devices with In 2 TiO 5 with CF 4 plasma[35], TbY x O y[45], CeO 2…”

High throughput screening of pure silica zeolites for CF4 capture from electronics industry gas

“…It serves as an insulator and arc-suppressant, exhibiting outstanding electrical properties and efficient arc extinction capabilities. 1–3 Additionally, its chemical inertness and thermal stability render it valuable in various chemical reactions. 4 The electronics industry extensively employs CF 4 as a fluorinated gas, particularly in semiconductor cleaning processes, where it effectively eliminates particles, metal contaminants, organic residues, and compound residues from silicon wafers.…”