2015
DOI: 10.1063/1.4913630
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Complete vertical M-H loop shift in La0.7Sr0.3MnO3/SrRuO3 thin film heterostructures

Abstract: In the current work, we have epitaxially integrated La0.7Sr0.3MnO3/SrRuO3 (LSMO/SRO) BLs with the technologically important substrate Si (100) using pulsed laser deposition. Interestingly, at 4 K, under the magnetic field sweep of ±1500 Oe, a complete vertical M-H loop shift is observed in the sample prepared with 180 nm SRO thickness, which is unusual. This vertical shift persists even up to a field sweep range of ±6000 Oe, at which point the shift disappears and a symmetrical hysteresis loop centered at the … Show more

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Cited by 18 publications
(21 citation statements)
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“…[14,[7][8][9][10][11] The spin magnetic moment of this sample is estimated at 1.2 µ B per Ru 4+ ion, consistent with previously reported values (1.1-1.6 µ B per Ru 4+ ion) for the bulk SRO thin films. As shown by the curve in red, the sample with only LCMO layer exhibits characteristic [4,5] T C at about 240 K. The saturation magnetization is estimated at 3.…”
Section: Functional Oxides Research Lettersupporting
confidence: 77%
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“…[14,[7][8][9][10][11] The spin magnetic moment of this sample is estimated at 1.2 µ B per Ru 4+ ion, consistent with previously reported values (1.1-1.6 µ B per Ru 4+ ion) for the bulk SRO thin films. As shown by the curve in red, the sample with only LCMO layer exhibits characteristic [4,5] T C at about 240 K. The saturation magnetization is estimated at 3.…”
Section: Functional Oxides Research Lettersupporting
confidence: 77%
“…As shown by the curve in red, the sample with only LCMO layer exhibits characteristic [4,5] T C at about 240 K. The saturation magnetization is estimated at 3. [6,[7][8][9][10][11] on relaxed SRO thin films. The M-H curve (in red) recorded from LCMO layer also reveals a clear saturation behavior characterized by H c of 625 Oe (see inset of Fig.…”
Section: Functional Oxides Research Lettermentioning
confidence: 99%
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“…We have grown La 0.7 Sr 0.3 MnO 3 /SrRuO 3 /SrTiO 3 (STO)/MgO/TiN/Si (1 0 0) heterostructures and optimized the growth conditions for each layer in this geometry. This work is facilitated by the deposition of an epitaxial TiN (a = 4.24 Å) layer, in which, three lattice plans of Si (a = 5.43 Å) match very well with four of TiN (a = 4.24 Å) and the epitaxial growth occurs via domain matching epitaxy (DME) [5][6][7][8]. Each layer in this heterostructure was grown epitaxially.…”
Section: Introductionmentioning
confidence: 99%
“…This selection of buffer layers made it possible to integrate epitaxial thin film of LSMO/SRO on Si(1 0 0). The prototype bilayers based on these oxides were thoroughly characterized with in-plane and out-of-plane XRD, TEM and STEM-Z techniques as reported [5] in our earlier work. The temperature-and magnetic-field dependent magnetization measurements were carried out using a Quantum design MPMS SQUID dc magnetometer with the sensitivity 610-8 emu at 0 T. The magnetic field is applied along [1 0 0] direction of the sample.…”
Section: Introductionmentioning
confidence: 99%