1971
DOI: 10.1049/el:19710496
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Computer comparison of n +pp + and p +nn + junction silicon diodes for IMPATT oscillators

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1973
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Cited by 4 publications
(3 citation statements)
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“…IMPATT diodes of this structure have apparently rarely been fabricated. Following our suggestion [20] that the n+-p-p+ structure in Si appears promising for high efficiency, Udelson and Ward [36] reported the results of a large-signal computation which strongly supported the idea. Subsequently, Ying [37] reported achieving 12-percent efficiency at 8.7 GHz in an n+-p-p+ Si structure, which is distinguishably higher than the best reported for the complementary structure.…”
mentioning
confidence: 60%
“…IMPATT diodes of this structure have apparently rarely been fabricated. Following our suggestion [20] that the n+-p-p+ structure in Si appears promising for high efficiency, Udelson and Ward [36] reported the results of a large-signal computation which strongly supported the idea. Subsequently, Ying [37] reported achieving 12-percent efficiency at 8.7 GHz in an n+-p-p+ Si structure, which is distinguishably higher than the best reported for the complementary structure.…”
mentioning
confidence: 60%
“…Further, the extent of the un-depleted region between the edge of the depletion region and interface of epitaxy and substrate (un-swept epitaxy) which contributes positive resistance and thereby causes serious power loss is expected to be smaller in GaN-based p ++ n n ++ diode, because of higher mobility of electrons than that of holes in GaN [10]. Moreover, for any semiconductor, the avalanche zone width is smallest when the structure is chosen so that the carrier with highest ionization rate drifts towards the junction [11]. It was observed that avalanche zone of n ++ p p ++ structure is narrower than its complimentary structure in Si IMPATTs [11] which leads the higher efficiency in n ++ p p ++ Si IMPATTs.…”
Section: Computer Simulation Methodologiesmentioning
confidence: 99%
“…Moreover, for any semiconductor, the avalanche zone width is smallest when the structure is chosen so that the carrier with highest ionization rate drifts towards the junction [11]. It was observed that avalanche zone of n ++ p p ++ structure is narrower than its complimentary structure in Si IMPATTs [11] which leads the higher efficiency in n ++ p p ++ Si IMPATTs. While the situation is just reversed in InP- and GaAs-based SDR IMPATTs [12, 13].…”
Section: Computer Simulation Methodologiesmentioning
confidence: 99%