Conductive Atomic Force Microscope Nanopatterning of Hydrogen-Passivated Silicon in Inert Organic Solvents

Kinser, C. Reagan; Schmitz, Matthew J.; Hersam, Mark C.

doi:10.1021/nl048275q

Cited by 46 publications

(35 citation statements)

References 29 publications

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“…Similarly, recent work was performed by Garcia and co-workers [23,26] using an ethyl alcohol meniscus in the tip/substrate gap. Most recently, the same group has achieved < 5 nm resolution using a solvent meniscus condensed from octane vapour.[27] Of particular relevance to our work, are the findings reported by Hersam and co-workers [28,29] for contact mode patterning in hexadecane on H:Si(111). Both the growth kinetics and the chemical behavior of the deposited features were consistent with field induced oxidation (FIO) of silicon.…”

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confidence: 50%

“…This is consistent with previous reports of high-field lithography in hexadecane on H:Si(111), where patterning in contact mode affords a stable water meniscus even on a relatively hydrophobic surface (contact angle 79°). [28,29] Alternatively, when patterning in tapping mode on the hydrophobic HMDS terminated surface, water cannot form a stable meniscus and the solvent present in the active region bears the brunt of the high energy modification process. Under such high field conditions, the solvent readily decomposes, depositing etch resistant features rich in sp 2 hybridized carbon.…”

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confidence: 99%

“…[4,28,29] In Figure 2a, the 1.5 nm tall features that are observed were fabricated at a scan rate of 1 lm s -1 with a 12 V bias applied on the sample.…”

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High‐Field Scanning Probe Lithography in Hexadecane: Transitioning from Field Induced Oxidation to Solvent Decomposition through Surface Modification

et al. 2007

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In the recent past, a variety of scanning-probe techniques [1][2][3] have been employed to generate nanometer-size structures on semiconducting, [4][5][6][7][8][9][10] metallic, [11,12] and organic surfaces. [13][14][15][16][17][18][19] In general, these methods utilize the proximity of the scanning probe to generate an intense electric field (ca. 10 9 V m -1 ) by applying a relatively low bias of the order of a few volts. The oxidation of silicon in air using surface adsorbed water as the medium between tip and substrate has been studied most extensively. [4][5][6][7][8][9][10] Field-induced techniques have been employed to pattern larger areas in parallel through the use of a stamp coated with conducting material. [20][21][22] The ultimate lateral resolution of field-induced lithography is directly related to the dimensions of the protruding features of the stamp or the sharpness of the scanning probe. Recently, there have been ongoing efforts to replace the water in the tip/substrate gap with organic solvents in order to explore novel field-induced chemical reactions. [23][24][25][26][27][28][29] For example, the deposition of etch resistant features was previously demonstrated in our laboratories [24] using common solvents such as toluene, n-octane, ethyl alcohol, and dioxane as the medium between the sample and the tip of an atomic force microscope (AFM) operated in fluid. Similarly, recent work was performed by Garcia and co-workers [23,26] using an ethyl alcohol meniscus in the tip/substrate gap. Most recently, the same group has achieved < 5 nm resolution using a solvent meniscus condensed from octane vapour.[27] Of particular relevance to our work, are the findings reported by Hersam and co-workers [28,29] for contact mode patterning in hexadecane on H:Si(111). Both the growth kinetics and the chemical behavior of the deposited features were consistent with field induced oxidation (FIO) of silicon. The authors conclude that oxidation of the silicon surface occurs in the meniscus formed between the probe and the surface by the water dissolved in the fluid, with minimal effects on the reaction from the surrounding solvent. It is important to note that the water content in hexadecane is reported to be three-fold higher than that found in n-octane at same pressure and humidity.[30]In the present work, the role of surface hydrophobocity in the high field scanning probe nanolithography in hexadecane is investigated. A schematic representation of the setup employed is shown in Figure 1a. In this setup, both the probe of the atomic force microscope and the sample are immersed in the solvent to carry out the patterning and the initial imaging of the nanostructures. For patterning, a potential difference is applied between the probe and the sample (positive on the sample) while the tip is translated across the desired location kept in close proximity to the surface. The results obtained after patterning both a hydrophilic silicon oxide surface (contact angle ca. 0°) and hydrophobic TMS terminated surface (contact ...

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High‐Field Scanning Probe Lithography in Hexadecane: Transitioning from Field Induced Oxidation to Solvent Decomposition through Surface Modification

et al. 2007

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“…40 Because the fabricated structures were not etched by HF, it was concluded that those structures were not silicon oxides. However, experiments performed in other nonpolar organic solvents such as hexadecane 41 and 1-octene 42 gave rise to structures that showed chemical and kinetic behaviour consistent with field induced oxidation in air. The above experiments reveal that on the same substrate (Si) the composition of the fabricated structure is organic solvent dependent.…”

Section: Local Chemical Nanolithographymentioning

confidence: 99%

Nano-chemistry and scanning probe nanolithographies

García¹,

Martínez²,

Martínez³

2006

Chem. Soc. Rev.

361

306

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The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The unique imaging and manipulation properties of atomic force microscopes have prompted the emergence of several scanning probe-based nanolithographies. In this tutorial review we present the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface. The potential of local chemical nanolithography in nanometer-scale science and technology is illustrated by describing a range of applications such as the fabrication of conjugated molecular wires, optical microlenses, complex quantum devices or tailored chemical surfaces for controlling biorecognition processes.

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“…6 However, since the surface reactivity is essentially ruled by the presence of dangling bonds at surface, most experiments were done using the hydrogen terminated Si substrates. [7][8][9][10] Such surface passivation at the same time prevents spurious oxidation processes and induces a barrier for chemisorption, so that further dynamical mechanisms are required to promote the reaction. This was the case, e.g.…”

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confidence: 99%