Nano-chemistry and scanning probe nanolithographies

García, Ricardo García; Martínez, Ramsés V.; Martínez, Javier López

doi:10.1039/b501599p

Cited by 361 publications

(315 citation statements)

References 55 publications

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“…However, the generality and robustness of the underlying chemical process (anodic oxidation) has transformed Dagata's observation into a reliable a versatile nanolithography approach for patterning and device fabrication 42 . Nanopatterning examples range from the generation of arrays of sub-micrometre lines and dots on crystalline surfaces 66-68 , self-assembled monolayers [69][70][71] Other applications include the use of the local oxide as a coating to embed nanoparticles on a silicon surface 96 .…”

Section: Oxidation Splmentioning

confidence: 99%

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Advanced scanning probe lithography

2014

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The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on the methods and processes that offer genuinely lithography capabilities such as those based on thermal effects, chemical reactions and voltage-induced processes. Published in:Nature Nanotechnology 9, 577-587 (2014) Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometre-scale structures. A variety of materials and systems such as nanoparticles, nanowires, two-dimensional materials like graphene and transition metal dichalcogenides, plasmonics materials, conjugated polymers and organic semiconductors are finding applications in nanoelectronics, nanophotonics, organic electronics and biomedical applications. The success of many of the above applications relies on the existence of suitable nanolithography approaches. However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 . Figure 1a shows a general scheme of SPL operation. There is a variety of approaches to modify a material in a probe-surface interface which have generated several SPL methods. Scanning probe lithographies can be either classified by emphasizing the distinction between the general nature of the process, chemical versus physical, or by considering if SPL implies the removal or addition of material. However, we consider it is more inclusive and systematic to classify the different SPL methods in terms of the driving mechanisms used in the patterning process, namely thermal, electrical, mechanical and diffusive methods (Fig. 1b). Challenges in nanoscale lithographyThe workhorse of large volume CMOS fabrication, o...

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Section: Oxidation Splmentioning

confidence: 99%

“…Oxidation SPL can be either performed with the tip in contact with the sample surface or in a non-contact mode. The electric field has three roles in tip-based oxidation 42 . It induces the formation of the water bridge.…”

Section: Oxidation Splmentioning

confidence: 99%

Advanced scanning probe lithography

2014

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“…Selective oxidation of a self-assembled monolayer is also possible [2]. While this type of nanoshaving can lead to well defined "nanoscale" features in a monolayer molecular film [1][2][3][4][5][6][7][8][9][10][11], selective mechanical "cutting" or bond breaking within the molecule, for only part of the molecular film, has not been demonstrated. Over-cutting or etching using an AFM tip is certainly possible [3][4][5][6][7]12], but mechanically engineering the organic surface selectively within the monomolecular layer opens up new vistas for selective nanoscale surface modifications and surface chemistry.…”

Section: Introductionmentioning

confidence: 99%

“…The former type of processing is nanoshaving [1][2][3][4][5][6][7] and the latter is "dip pen" nanolithography or "nanografting" [1,2,[8][9][10][11]. Selective oxidation of a self-assembled monolayer is also possible [2]. While this type of nanoshaving can lead to well defined "nanoscale" features in a monolayer molecular film [1][2][3][4][5][6][7][8][9][10][11], selective mechanical "cutting" or bond breaking within the molecule, for only part of the molecular film, has not been demonstrated.…”

Section: Introductionmentioning

confidence: 99%