2009
DOI: 10.1016/j.matlet.2009.01.025
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Selective nanoshaving of self-assembled monolayers of 2-(4-pyridylethyl)triethoxysilane

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Cited by 21 publications
(18 citation statements)
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(45 reference statements)
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“…e mechanism of shaving may be explained in relation to the bond energies of the molecules within the monolayer. e Si-O bond energy is 4.685 eV, and the Si-C bond energy is 0.788 eV [24].…”
Section: Resultsmentioning
confidence: 99%
“…e mechanism of shaving may be explained in relation to the bond energies of the molecules within the monolayer. e Si-O bond energy is 4.685 eV, and the Si-C bond energy is 0.788 eV [24].…”
Section: Resultsmentioning
confidence: 99%
“…After nanoshaving is performed, a “hole” is fabricated, exposing the HOPG or SiO 2 substrates. The depth of the resulting “hole” measures the thickness of the ferroelectric ultrathin film; the technique has been a useful tool to determine the conformation of the molecules in it (Amro et al ., 2000; Liu et al ., 2000; Piner et al ., ’99; Rosa et al ., 2009a; Liang et al ., 2007; Rosa et al ., 2009a)]. The cross-sectional analysis, which makes direct depth measurements of the “holes” by producing line profiles, indicates the thickness of the thin film.…”
Section: Resultsmentioning
confidence: 99%
“…The process of nanoshaving has been described extensively elsewhere (Amro et al ., 2000; Liu et al ., 2000; Piner et al ., ’99; Rosa et al ., 2009a; Liang et al ., 2007; Rosa et al ., 2009a). Basically, an AFM tip is used, at low force, to image the surface morphology and select a region for nanolithography.…”
Section: Sample Preparationmentioning
confidence: 99%
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“…The process of nanoshaving has been described extensively elsewhere [11][12][13][27][28][29]. Briefly, an AFM tip is used, at low force, to image the surface morphology and to select a region for nanolithography.…”
Section: Atomic Force Microscopy (Afm) Characterization and Nanoshavingmentioning
confidence: 99%