“…The power of nanotechnology is that it offers novel high resolution nanopatterning techniques to overcome the restrictions of conventional lithography [ 1 , 2 ]. With that purpose, several lithographic methods have been developed in the past, including those based on scanning probe microscopy (SPM) (scanning probe lithography [ 3 ], nano stencil lithography [ 4 , 5 ], dip-pen nanolithography [ 6 , 7 ]) and methods based on stamps or masks (soft-lithography [ 8 ], nanoimprinting [ 9 ], nano sphere lithography [ 10 , 11 , 12 ], and unconventional wet lithography [ 13 , 14 ]), nanoimprint lithography (NIL), [ 15 , 16 ] and electrochemical lithography [ 17 ]. These methods offer important advantages, such as high efficiency (soft and nano sphere lithography), suitability for large areas (soft, unconventional lithography and nanoimprinting), a few nanometers resolution (nanoimprinting, scanning probe lithography, nanostencil, and dip-pen nanolithography), high versatility (soft unconventional lithography and nanoimprinting), and direct processability of solutions (soft and unconventional lithography).…”