Contribution of ion emission to sputtering of uranium dioxide by highly charged ions

AODO: Secondary ion emission and surface modification

“…The most intensive ones belong to hydrogen (H + and H þ 2 ), the (UO x ) monomer, and the first uranium dioxide cluster (UO x ) 2 . Cluster emission indeed contributes up to 70% to the yield of sputtered positive ions from uranium dioxide [9]. An important contribution of cluster emission is also observed in the case of lithium fluoride in the electronic stopping regime [12,13], and we recently obtained data which allow a comparison of the energy and angular distributions of Li + monomers and the first cluster (LiF) n Li + (n = 1) Fig.…”

“…Thus, they offer the unique possibility to study the contribution of the different physical mechanisms of energy deposition to surface modification and sputtering. For example, angular distributions of emitted neutrals (catcher technique) [7,8] or secondary ion mass spectra (''time-of-flight" TOF) of sputtered particles from uranium dioxide (UO 2 ) both at high energy in the electronic stopping regime (%MeV/u) and with very low energy highly charged ions (%q keV) [7,9] were performed at GANIL.…”

Dessorção Iônica Induzida Por Íons Energéticos Pesados Em Gelos Astrofísicos: H2o, C2h2, C2h6 E N2o

“…Isso porque em outros trabalhos, principalmente os realizados com alvos gasosos, onde foram medidos número muito grandes de agregados (n ∼ 50), notou-se que o melhor ajuste é feito através de uma lei de potência Y=Y 0 n −δ , onde δ diminui com o aumento da massa do projétil. Esses resultados concordam com os antecipados por modelos com ejeções coletivas, como o modelo hidrodinâmico, com transição de fase (BOUDJADAR et al, 2005;URBASSEK, 1988).…”