Vertically correlated islands of a quality comparable to the model system InAs/GaAs have been fabricated using modified molecular beam epitaxy. While island widths range from 20-50 nm, island heights are very homogeneous, resulting in narrow photoluminescence (PL) emission line width of 20-40 meV even for stacks of 50 layers. Island centers contain Cd concentrations up to more than 80%. Distinct PL double peaks can be assigned to correlated island stacks with large islands and the uncorrelated region, containing much smaller, laterally interacting islands.Introduction Highly controllable, self-organizing and self-limiting growth processes allow the fabrication of strongly correlated quantum island (QI) structures in the III-V system InAs/GaAs [1]. Devices like lasers [2] were already demonstrated and many new concepts are proposed, for example quantum information processing and spintronics [3]. To further extend possible applications to emitters in the green spectral range or to include semi-magnetic substances like Mn for spin dependent systems, it is desirable to achieve similarly well controlled structures in the CdSe/ZnSe system. However, in conventional molecular beam epitaxy (MBE) a reliable formation of islands is often hindered by a direct competition between island formation and relaxation via misfit dislocations, owing to the suppleness of the II-VI materials. Previously, temperature sequences, like those used in low temperature atomic layer epitaxy [4,5], were employed to change the thermodynamic conditions in favor of island formation. Recently we introduced a new growth technique which employs a CdS compound source instead of the conventional Cd elemental source [6]. This modification to standard MBE allows the growth of highly correlated vertical CdSe quantum island stacks (QIS) with similar quality as in the InAs/GaAs system and makes the complex sequential growth techniques obsolete.