“…It is worth noting that the attainment of uniform film morphology is paramount for fabricating devices with consistent performance across a large area. This is because the morphology of MHP crystals, including attributes such as grain size and film thickness, fundamentally dictates their carrier generation and transport properties, and hence, their overall optoelectronic performance. ,, While prior reports on vapor deposition of MHPs have emphasized their potential for large-area film growth, , the majority employ direct source evaporation onto a substrate in a vacuum chamber. , This approach inherently increases production cost due to the necessity of maintaining high-vacuum background and often suffers from a slow growth rate, with growth variables closely tied to specific system geometries. In contrast, the tube furnace system offers versatility for the cost-effective growth of low-dimensional crystalline materials, such as 1D nanowires, , 2D materials, , and thin films. , With its capacity for high quality and yield, the tube furnace stands out as a more suitable option for potential scale-up processes, such as continuous roll-to-roll processing on a large-area substrate .…”