Gallium nitride (GaN) high-electron-mobility transistor (HEMT) devices, which have wide application potential from power amplifiers to satellite, need to be thoroughly examined in terms of reliability in order to benefit the superior intrinsic properties of the device. The most critical parameter in the device reliability is the hotspot, or T max , which occurs somewhere on the subsurface and along the channel of the GaN HEMT, which is optically inaccessible due to optical path disability. Therefore, the T max value is underestimated in optical measurements, such as the thermographic IR and Raman methods. With 3-D electrothermal simulations, T max is obtained close to reality, but it requires a huge computation load and the complex modeling of semiconductor device physics. In 2-D or 3-D thermal simulations that do not use electrothermal simulations, since the self-heating is mostly modeled with a single heat source, neither the correct T max value is obtained nor the effect of bias conditions is considered. To address the aforementioned shortcomings, a hybrid method is demonstrated, which exploits the electrical measurements of GaN HEMT, which RF and reliability engineers often and easily do. It is demonstrated that T max can be determined quickly and close to the electrothermal simulations in a GaN HEMT Manuscript