2010
DOI: 10.3938/jkps.57.1970
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Correlation Between Barrier Heights and Ideality Factors of Ni/n-Ge (100) Schottky Barrier Diodes

Abstract: We computed the homogeneous Schottky barrier height (SBH) at ideality factor (n) = 1.0 of Ni/nGe (100) Schottky diodes (SDs). The SDs were identically prepared by using resistive evaporation of Ni on n-Ge (100). The SBHs and n of these diodes (24 dots) were calculated from their experimental forward bias current-voltage (I-V ) and reverse bias capacitance-voltage (C-V ) measurements at room temperature. Even though the Schottky diodes were identically prepared, the values of the SBH from the I-V characteristic… Show more

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Cited by 11 publications
(4 citation statements)
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References 42 publications
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“…Similar results have been reported [35]. Therefore, further studies are needed to clarify these results.…”
Section: Resultssupporting
confidence: 75%
See 1 more Smart Citation
“…Similar results have been reported [35]. Therefore, further studies are needed to clarify these results.…”
Section: Resultssupporting
confidence: 75%
“…Although in previous studies focus has been on the reactions of germanium with Pd [6,[14][15][16][17][18][19][20][21][22][23], Pt [6,13,22,[24][25][26][27][28][29], and Ni [6,9,11,[13][14][15][16]22,[28][29][30][31][32][33][34][35][36][37][38], so far there is very little literature on reactions of germanium with Ir [39]. Gaudet et al [6] carried out a systematic study of thermally induced reaction of 20 transition metals with Ge substrates.…”
Section: Introductionmentioning
confidence: 99%
“…The high value of ideality factors are discussed by other researchers and their validations were laid on higher recombination through point defect states or trap-aided tunnelling [53]. Thus, the increase in ideality factor may be due to increasing inhomogeneity of contact, interfacial surface defects [54,55].…”
Section: Conductivity Measurementmentioning
confidence: 96%
“…Among all stable stoichiometric Ni-Ge phases, it is generally accepted that the Ni-Ge phase is best suited for ohmic metal contact formation, due to low sheet resistance, good stability under heat treatment, and low forming temperature [18,19]. In this context, the Ni-Ge system was intensively investigated by different experimental methods (such as transmission electron microscopy (TEM) [20,21], x-ray diffraction (XRD) [22,23], electrical characterization [24,25], and x-ray photoelectron spectroscopy (XPS) [26]) as well as theoretical calculations [27,28]. Most of these investigations were thus carried out by means of spatially averaging characterization techniques and only few methods with nanoscale resolution were applied to study in situ the Ni-Ge interaction [29].…”
Section: Introductionmentioning
confidence: 99%