“…Among all stable stoichiometric Ni-Ge phases, it is generally accepted that the Ni-Ge phase is best suited for ohmic metal contact formation, due to low sheet resistance, good stability under heat treatment, and low forming temperature [18,19]. In this context, the Ni-Ge system was intensively investigated by different experimental methods (such as transmission electron microscopy (TEM) [20,21], x-ray diffraction (XRD) [22,23], electrical characterization [24,25], and x-ray photoelectron spectroscopy (XPS) [26]) as well as theoretical calculations [27,28]. Most of these investigations were thus carried out by means of spatially averaging characterization techniques and only few methods with nanoscale resolution were applied to study in situ the Ni-Ge interaction [29].…”