“…R NiO 3 thin films show inconsistent MIT characteristics, and can have different T
MI even at the same lattice mismatch 6, 17–20 . For example, NdNiO 3 (NNO) films grown on LaAlO 3 substrates have T
MI ranging from 175 K to 0 K 6, 18, 20, 21 , which indicates the difficulty of synthesizing R NiO 3 that has the desired cation ratio ( R /Ni) and the degree of oxygen deficiency (δ). In the previous studies, oxygen deficiency in R NiO 3 epitaxial films has been controlled by varying p (O 2 ) during their growth 13, 15, 20 .…”