2005
DOI: 10.1007/s00339-005-3302-5
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Correlation between target–substrate distance and oxygen pressure in pulsed laser deposition of complex oxide thin films

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Cited by 15 publications
(7 citation statements)
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“…Target-substrate distance has been shown to influence the texture, orientation, and crystallite size of thin films such as the superconducting oxide YBa 2 Cu 3 O 7 [16][17][18][19][20]. Each value of O 2 background pressure possesses a corresponding optimal targetsubstrate distance.…”
Section: Introductionmentioning
confidence: 98%
“…Target-substrate distance has been shown to influence the texture, orientation, and crystallite size of thin films such as the superconducting oxide YBa 2 Cu 3 O 7 [16][17][18][19][20]. Each value of O 2 background pressure possesses a corresponding optimal targetsubstrate distance.…”
Section: Introductionmentioning
confidence: 98%
“…[1][2][3][4] Interaction of ultrafast laser beams with materials can be exploited as a source of high-energy radiation such as extreme ultraviolet and X-rays. 5,6 Other potential applications of pulsed LA of materials include micro-machining, 7,8 nanoparticle synthesis, 9,10 polymer fabrication, 11 film growth by pulsed laser deposition, [12][13][14] and elemental analysis. [15][16][17][18] The LPPs are highly transient and dynamic in nature.…”
Section: Introductionmentioning
confidence: 99%
“…The plasma freezes out beyond a characteristic distance (D) due to interaction of plasma plume with the background gas so that flux thermalizes and loses its unidirectional velocity. The quantitative understanding of the Pressure-Distance scaling relationship can be obtained with the help of blastwave model [28], but we have used the qualitative model [29,30] in this work. If N 0 atoms absorb the laser radiation and are ejected from a point source (D=0) into a background gas, the plasma distribution can be approximated to a diverging cone such that its volume is D 3 /3.…”
Section: Methodsmentioning
confidence: 99%