Corrosion resistance of CrN thin films produced by dc magnetron sputtering

Ruden, Alexander; Restrepo-Parra, E.; Paladines, A. U.; Sequeda, Federico

doi:10.1016/j.apsusc.2012.12.148

Cited by 95 publications

(30 citation statements)

References 40 publications

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“…R p can be considered as an indicator of the corrosion resistance of the material, which is inversely proportional to the corrosion velocity [11,41]. This confirms our earlier results that the (Cr/ CrN/CrAlN)-PVD3 coating presents the highest corrosion resistance and the best electrochemical behavior when immersed in the 3 wt% NaCl aggressive solution (Table 4).…”

Section: Electrochemical Impedance Spectroscopy Measurementssupporting

confidence: 76%

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Tribological and electrochemical performances of Cr/CrN and Cr/CrN/CrAlN multilayer coatings deposited by RF magnetron sputtering

Beliardouh

Bouzid

Nouveau

et al. 2015

Tribology International

112

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is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. a b s t r a c tCrN/CrAlN and Cr/CrN/CrAlN multilayers were grown with dual RF magnetron sputtering. The application of these multilayers will be wood machining of green wood. That is why ball-on-disc and electrochemical tests in NaCl aqueous solution were realized to elucidate the tribological and corrosion behavior of these coatings as they will be exposed to wear and corrosion during wood machining process. The samples/alumina and samples/WC coupling showed different wear mechanisms. The 300 nm thick Cr/CrN/CrAlN multilayer demonstrated the best tribological behavior and corrosion resistance. The influence of growth defects on corrosion resistance has been shown. .

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Section: Electrochemical Impedance Spectroscopy Measurementssupporting

confidence: 76%

“…Finally, our study indicates that all of our CrN/CrAlN and Cr/CrN/CrAlN multilayer coatings present better behavior against aggressive chloride ions (Cl À ) when compared to similar CrAlN based coatings, as reported in other studies [35,37,38,41,42]. Yet, each of our coatings exhibited different electrochemical behaviors.…”

Section: Sem Investigationsmentioning

confidence: 44%

Tribological and electrochemical performances of Cr/CrN and Cr/CrN/CrAlN multilayer coatings deposited by RF magnetron sputtering

Beliardouh

Bouzid

Nouveau

et al. 2015

Tribology International

112

View full text Add to dashboard Cite

show abstract

“…The resistivity shows the discontinuity at around 250-284 K (marked in curve), as shown in Figure 4(b), which is associated with a structural phase transition. This discontinuity could be occurred due to the grain boundary changes in the film and as well as changing in the shape and volume of the unit cell during phase transition 20 . Most polycrystalline CrN films exhibits the phase transitions due to distort the individual grains in different directions and the associated volume reduction would provide sufficient space within the microstructure for grain boundary slide.…”

Section: Methodsmentioning

confidence: 99%

Thickness Dependent Structural and Electrical Properties of Magnetron Sputtered Nanostructured CrN Thin Films

Akkera¹,

Reddy²,

Sekhar

2017

Mat. Res.

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In the present work, we have investigated the structural and electrical properties of CrN thin films for a thickness t in the 30-220 nm range, grown on Si (100) substrates. The CrN/Si (100) films exhibits a structural transition from hexagonal phase (β-Cr 2 N) to cubic phase (CrN) with the increasing in film thickness, the change in structural transition is attributed to the decrease of film-substrate interfacial strain. From electrical resistivity measurements, the thickness of 150 nm CrN/Si (100) film shown the metal-semiconductor phase transition at around 250 K with energy band gap (E g ) 81 meV in semiconducting region, whereas the thickness of 30, 110 and 220 nm CrN/Si(100) films were shown only semiconducting behaviour for whole temperature range of 50-400 K. On the other hand, a clear grain size was increased in CrN/Si films with increasing thickness and its influence on transport properties was also seen. The possibility of phase transition and occurrence of semiconducting behaviour in the CrN films were analysed.

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“…The base vacuum pressure in the reactor was on the order of 1 x10 -4 Pa; then, plasma cleaning in the chamber under an argon atmosphere was applied to the samples for a duration of 15 minutes to remove any impurities that were not eliminated by the ultrasonic cleaning. The working pressure and target power densities were determined by obtaining the I-V plot for 0.4, 0.5, 0.7, and 0.8 Pa. Three samples were grown per each process conditions, obtaining a better repeatability when using a working pressure of 0.4 Pa [10][11][12]. WS 2 cathode was kept at a constant power density of 2.5 W/cm 2 , while the power density of the Ti cathode was varied between 0 and 1.5 W/cm 2 , taking values of 0, 0.25, 0.5, 0.75, 1 and 1.25 W/cm 2 .…”

Section: Methodsmentioning

confidence: 99%

Structure and Properties of Titanium Doped Tungsten Disulfide Thin Films Produced via the Magnetron Co-Sputtering DC Technique

Carmona

Sequeda

2016

Matéria (Rio J.)

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In this work, titanium doped tungsten disulfide thin films (WS 2 -Ti) were deposited on AISI 304 stainlesssteel substrates using the magnetron co-sputtering DC technique. Films were produced with varying titaniumcathode power from 0 to 25 W. The titanium content of the WS 2 structure was determined using energy dispersive spectroscopy (EDS), thereby obtaining a maximum of 10% for the sample grown at 25 W. X-ray diffraction (XRD) results indicated, for the pure sample, the presence of a hexagonal phase of high intensity on the (103) plane. However, with the addition of titanium, the WS 2 crystallinity was reduced; nevertheless, when the titanium content was equal to 10%, nanocomposite formation was promoted. This effect was observed in TEM (transmission electron microscopy) images. Finally, the tribological behavior was determined using a ball on disk (BOD) test. With this method, friction coefficient curves were obtained with respect to the number of cycles, allowing the measurement of friction coefficient values of 0.1 for the pure sample and 0.15 for the sample grown at 5 W. Because of the low thickness of the samples, all of them failed during the first cycles.

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Corrosion resistance of CrN thin films produced by dc magnetron sputtering

Cited by 95 publications

References 40 publications

Tribological and electrochemical performances of Cr/CrN and Cr/CrN/CrAlN multilayer coatings deposited by RF magnetron sputtering

Tribological and electrochemical performances of Cr/CrN and Cr/CrN/CrAlN multilayer coatings deposited by RF magnetron sputtering

Thickness Dependent Structural and Electrical Properties of Magnetron Sputtered Nanostructured CrN Thin Films

Structure and Properties of Titanium Doped Tungsten Disulfide Thin Films Produced via the Magnetron Co-Sputtering DC Technique

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