Critical Dimension Atomic Force Microscopy for Sub-50-nm Microelectronics Technology Nodes

“…CD-AFM, a technique modified in 1994 for sidewall measurements on the basis of a flared tip [11], has since been improved by AFM manufacturers and national metrology institutes (NMIs) and is now a standard metrology technique [8,[12][13][14][15][16][17]. In CD-AFM, the scan is controlled both vertically and horizontally by detecting atomic forces in two directions, thus allowing the tracing of the vertical sidewalls of line patterns and the measurement of various other 3D parameters.…”

Section: Introductionmentioning

confidence: 99%

Development of a metrological atomic force microscope with a tip-tilting mechanism for 3D nanometrology

Kizu

Misumi

Hirai

et al. 2018

Meas. Sci. Technol.

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A metrological atomic force microscope with a tip-tilting mechanism (tilting-mAFM) has been developed to expand the capabilities of 3D nanometrology, particularly for highresolution topography measurements at the surfaces of vertical sidewalls and for traceable measurements of nanodevice linewidth. In the tilting-mAFM, the probe tip is tilted from vertical to 16° at maximum such that the probe tip can touch and trace the vertical sidewall of a nanometer-scale structure; the probe of a conventional atomic force microscope cannot reach the vertical surface because of its finite cone angle. Probe displacement is monitored in three axes by using high-resolution laser interferometry, which is traceable to the SI unit of length. A central-symmetric 3D scanner with a parallel spring structure allows probe scanning with extremely low interaxial crosstalk. A unique technique for scanning vertical sidewalls was also developed and applied. The experimental results indicated high repeatability in the scanned profiles and sidewall angle measurements. Moreover, the 3D measurement of a line pattern was demonstrated, and the data from both sidewalls were successfully stitched together with subnanometer accuracy. Finally, the critical dimension of the line pattern was obtained.

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“…A special challenge is the measurement and metrology of highly non-planar structures, such as trenches, holes, cavities, ridges, sidewalls, pillars and so on. Many of these applications require tips that are exceedingly long and slender, or have special sidetip geometries [1][2][3][4]. Among the many methods for manufacturing high aspect ratio (HAR) probes existing today, the most popular ones are on-axis (annular) FIB milling [4][5][6][7][8][9][10], electron beam induced deposition (EBID) [11][12][13][14], advanced silicon processing [15,16], carbon nanotube integration on the tip of the probe [17][18][19][20][21][22][23][24] and growth of whiskers [24].…”

Section: Introductionmentioning

confidence: 99%

“…Many of these applications require tips that are exceedingly long and slender, or have special sidetip geometries [1][2][3][4]. Among the many methods for manufacturing high aspect ratio (HAR) probes existing today, the most popular ones are on-axis (annular) FIB milling [4][5][6][7][8][9][10], electron beam induced deposition (EBID) [11][12][13][14], advanced silicon processing [15,16], carbon nanotube integration on the tip of the probe [17][18][19][20][21][22][23][24] and growth of whiskers [24]. None of these methods allow full freedom in terms of design, but typically excel in a rather limited range of applications.…”

Section: Introductionmentioning

confidence: 99%

Ultra-high aspect ratio replaceable AFM tips using deformation-suppressed focused ion beam milling

et al. 2013

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Fabrication of ultra-high aspect ratio exchangeable and customizable tips for atomic force microscopy (AFM) using lateral focused ion beam (FIB) milling is presented. While on-axis FIB milling does allow high aspect ratio (HAR) AFM tips to be defined, lateral milling gives far better flexibility in terms of defining the shape and size of the tip. Due to beam-induced deformation, it has so far not been possible to define HAR structures using lateral FIB milling. In this work we obtain aspect ratios of up to 45, with tip diameters down to 9 nm, by a deformation-suppressing writing strategy. Several FIB milling strategies for obtaining sharper tips are discussed. Finally, assembly of the HAR tips on a custom-designed probe as well as the first AFM scanning is shown.

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Critical Dimension Atomic Force Microscopy for Sub-50-nm Microelectronics Technology Nodes

Cited by 6 publications

References 30 publications

Extending the limits of Pt/C catalysts with passivation-gas-incorporated atomic layer deposition

Extending the limits of Pt/C catalysts with passivation-gas-incorporated atomic layer deposition

Development of a metrological atomic force microscope with a tip-tilting mechanism for 3D nanometrology

Ultra-high aspect ratio replaceable AFM tips using deformation-suppressed focused ion beam milling

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