1973
DOI: 10.1002/pssa.2210180104
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Critical voltage analysis of precipitation in certain nickel-base alloys

Abstract: The critical voltage in quenched (single phase) binary nickel alloys containing Au, Ta, Pt, Nb, Al, and Be has been determined in the AEI EM7 high voltage electron microscope. For the {400} reflection, Au and Ta cause a significant decrease of ≈ 10 kV per 1% addition. The resultant calibration curves have been used to follow the compositional changes of the nickel‐rich phase produced by ageing, and in the Ni‐Ta alloy the critical voltage measurements show that compositional gradients exist around the precipita… Show more

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Cited by 10 publications
(3 citation statements)
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“…5. The data of Butler (1972) as well as the room-temperature point in fig. 2 are superimposed on the plot.…”
Section: Ni-aumentioning
confidence: 99%
See 1 more Smart Citation
“…5. The data of Butler (1972) as well as the room-temperature point in fig. 2 are superimposed on the plot.…”
Section: Ni-aumentioning
confidence: 99%
“…In spite of its potential, and the increased availability of high-voltage electron microscopes, critical-voltage measurements have not been widely used in metallurgical applications. The technique has been used for studying local composition variations in Ni-base alloys (Butler 1972(Butler , 1973, composition variation of the Debye temperature in Fe-Cr alloys (Shirley, Lally, Thomas and Fisher 1975) and ordering in ordered Cu 3 Au and Ni 4 Mo (Sinclair et ale 1975), but there is little else for alloys apart from some scattered and uninterpreted critical voltages.…”
mentioning
confidence: 99%
“…Attempts at some form of combination of the two techniques have been made (Bell, 1971;Butler, 1972Butler, , 1973Hewat & Humphreys, 1974) but have failed to obtain CB patterns showing fine detail, a consequence of the large (roughly 1 tgn) spot sizes used. In these previous investigations an accuracy of approximately _+5 kV was obtained for the measurement of V~.…”
Section: (C) Convergent-beam Critical-voltage Measurementsmentioning
confidence: 99%