Mems/Nems
DOI: 10.1007/0-387-25786-1_15
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Crosslinked PMMA as a Low-Dimensional Dielectric Sacrificial Layer for MEMS/NEMS and Quantum Nanostructures Fabrication

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Cited by 2 publications
(2 citation statements)
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“…Masks were made using Electron-Beam Lithography by overexposing the PMMA and causing the PMMA polymers to be cross-linked as described in2627. The Nb was etched with Reactive Ion Etching (RIE) using SF 6 .…”
Section: Methodsmentioning
confidence: 99%
“…Masks were made using Electron-Beam Lithography by overexposing the PMMA and causing the PMMA polymers to be cross-linked as described in2627. The Nb was etched with Reactive Ion Etching (RIE) using SF 6 .…”
Section: Methodsmentioning
confidence: 99%
“…These technologies often require very expensive mechanical, chemical, or electrochemical instrumentation and will frequently damage delicate features or remove loosely attached microstructures from their substrate. To improve surface roughness, the use of complicated and expensive nanotechnology-based techniques to fabricate nanostructures varied in shape, type and dimension has been reported . The nanotechnology-based studies were predominantly directed at flat surfaces and usually cannot be transferred to miniaturized 3D features without challenges.…”
Section: Introductionmentioning
confidence: 99%