1998
DOI: 10.1063/1.1148944
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Cryogenic liquid-jet target for debris-free laser-plasma soft x-ray generation

Abstract: A new target system based on a continuous cryogenic liquid jet for debris-free laser-plasma soft x-ray generation is described. The system is experimentally evaluated with liquid nitrogen as target material. With this target the photon flux is 4.5ϫ10 11 photons/͑srϫpulse͒ from the ϭ2.88 nm N VI line. Brightness and stability are also investigated for this table-top soft x-ray microscope source. The possibility to utilize other cryogenic liquids such as neon, argon, and xenon and, thus, making the system intere… Show more

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Cited by 90 publications
(35 citation statements)
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“…Using a nozzle with piezoelectric aperture, a hydrodynamic instability is imprinted onto the water jet. Thus, a determined series of micrometersized water droplets is created in a certain distance from the nozzle [39,40]. Their diameter under experimental conditions is determined to be 15 μm.…”
Section: Methodsmentioning
confidence: 99%
“…Using a nozzle with piezoelectric aperture, a hydrodynamic instability is imprinted onto the water jet. Thus, a determined series of micrometersized water droplets is created in a certain distance from the nozzle [39,40]. Their diameter under experimental conditions is determined to be 15 μm.…”
Section: Methodsmentioning
confidence: 99%
“…[1][2][3][4][5][6] To estimate exposure times for a particular experiment, the absolute spectral emission of the x-ray source must be determined. Additionally, in order to guarantee stable source operation, real-time control of the plasma parameters is needed.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, it reduces debris production several orders of magnitude compared to conventional targets 6 and for certain liquids the debris deposition is practically eliminated. 3,5 Thus, the effective photon flux may be increased a few orders of magnitude compared to conventional targets since collection optics may be used reasonably close to the plasma. By choosing a suitable target liquid and correct plasma conditions, the emission wavelength may be spectrally tailored to suit different applications, e.g., the extreme ultraviolet ͑EUV͒ ͑ϳ0.1 keV, e.g., EUV lithography͒, 7-9 soft x rays ͑ϳ1 keV, e.g., microscopy and reflectometry͒, 2,3,5,10 and hard x rays ͑ϳ10 keV, e.g., diffraction͒.…”
Section: Introductionmentioning
confidence: 99%