“…Furthermore, it reduces debris production several orders of magnitude compared to conventional targets 6 and for certain liquids the debris deposition is practically eliminated. 3,5 Thus, the effective photon flux may be increased a few orders of magnitude compared to conventional targets since collection optics may be used reasonably close to the plasma. By choosing a suitable target liquid and correct plasma conditions, the emission wavelength may be spectrally tailored to suit different applications, e.g., the extreme ultraviolet ͑EUV͒ ͑ϳ0.1 keV, e.g., EUV lithography͒, 7-9 soft x rays ͑ϳ1 keV, e.g., microscopy and reflectometry͒, 2,3,5,10 and hard x rays ͑ϳ10 keV, e.g., diffraction͒.…”