1947
DOI: 10.1039/df9470100144
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Crystal growth at the cathode

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Cited by 137 publications
(37 citation statements)
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“…Since this concept is not well known, it is briefly explained in the following. Ϫ X 2 (cosh X 2 cos X 1 Ϫ 1)] [3] 22 ϭ Ϫ 0 X 2 (cosh X 2 cos X 1 Ϫ 1) [4] where X 1 ϭ 2x 1 /D, x 2 ϭ 2x 2 /D and 0 ϭ ϪGb/[2D(1 Ϫ )(cosh X 2 Ϫ cos X 1 ) 2 ] with G, b, , and D being the shear modulus, the burgers vector, Poisson's ratio, and the dislocation spacing, respectively. As x 2 r Ϯϱ, it is seen that 22 and 12 tend to vanish exponentially, but where sgn(x 2 ) ϭ Ϫ1 if x 2 > 0 and sgn(x 2 ) ϭ 1 if x 2 < 0.…”
Section: Resultsmentioning
confidence: 99%
“…Since this concept is not well known, it is briefly explained in the following. Ϫ X 2 (cosh X 2 cos X 1 Ϫ 1)] [3] 22 ϭ Ϫ 0 X 2 (cosh X 2 cos X 1 Ϫ 1) [4] where X 1 ϭ 2x 1 /D, x 2 ϭ 2x 2 /D and 0 ϭ ϪGb/[2D(1 Ϫ )(cosh X 2 Ϫ cos X 1 ) 2 ] with G, b, , and D being the shear modulus, the burgers vector, Poisson's ratio, and the dislocation spacing, respectively. As x 2 r Ϯϱ, it is seen that 22 and 12 tend to vanish exponentially, but where sgn(x 2 ) ϭ Ϫ1 if x 2 > 0 and sgn(x 2 ) ϭ 1 if x 2 < 0.…”
Section: Resultsmentioning
confidence: 99%
“…The rate of thin film deposition was also computed according to Faraday's law [35]: (10) where t is time, M is molecular weight, i is the current density, z is the electron valence, F is Faraday's constant, and ρ is the density of the coating species. Using MCS (Monte-Carlo…”
Section: Methodology Of MC Simulation Of Thin Film Depositionmentioning
confidence: 99%
“…For electro-plated Ni-base thin films, these properties are significantly affected by the texture and the grain structure of the coating. It is known that the texture of the coating is dependent on the composition of the electrolyte [1], substrate [2][3][4][5][6], and the condition of coating [7][8][9][10][11]. Among these, coating condition is the most dominant factor.…”
Section: Introductionmentioning
confidence: 99%
“…Hence, the true value of the transfer coefficient for the deposition of iron is (44) The concentration overpotential is related to the difference between the actual hydrogen evolution current, i H , and the diffusion-limiting current for the same process, i L , as (45) Hence, aEH,TJc=o 1 aEFe (46) So that the Eq. (44) can be written as (47) As iH ~ i L , the last term in Eq. (47) vanishes and ac,Fe = 1 -aH.…”
Section: The Role Of Hydroxo Complexes In Electrode Reactions With DImentioning
confidence: 99%