CuO/PMMA Polymer Nanocomposites as Novel Resist Materials for E-Beam Lithography

Geka, Georgia; Papageorgiou, George; Chatzichristidi, Margarita; Karydas, A. G.; Psycharis, Vassilis; Makarona, Eleni

doi:10.3390/nano11030762

Cited by 6 publications

(4 citation statements)

References 41 publications

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“…EBL is compatible with a wide range of materials, including metals, semiconductors, polymers, and insulators. This versatility makes it suitable for applications in various fields, such as electronics, photonics, biology, and materials science [64]. With EBL, patterns can be directly written on a substrate without the need for masks or photolithography techniques.…”

Section: Electron Beam Lithography (Ebl)mentioning

confidence: 99%

Integrated Optics: Platforms and Fabrication Methods

Butt

2023

Encyclopedia

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Integrated optics is a field of study and technology that focuses on the design, fabrication, and application of optical devices and systems using integrated circuit technology. It involves the integration of various optical components, such as waveguides, couplers, modulators, detectors, and lasers, into a single substrate. One of the key advantages of integrated optics is its compatibility with electronic integrated circuits. This compatibility enables seamless integration of optical and electronic functionalities onto the same chip, allowing efficient data transfer between optical and electronic domains. This synergy is crucial for applications such as optical interconnects in high-speed communication systems, optical sensing interfaces, and optoelectronic integrated circuits. This entry presents a brief study on some of the widely used and commercially available optical platforms and fabrication methods that can be used to create photonic integrated circuits.

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Section: Electron Beam Lithography (Ebl)mentioning

confidence: 99%

Integrated Optics: Platforms and Fabrication Methods

Butt

2023

Encyclopedia

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“…Polymers offer a trade-off between these two extremes since they have a refractive index ranging from 1.2 to 2 [ 10 , 11 , 12 ]. Moreover, direct electron beam lithography (EBL) is possible for some of them [ 13 , 14 ], and nanoimprinting is an interesting option for the fabrication of channel waveguides at large scale [ 15 , 16 ]. However, because of a refractive index close to that of the substrate, polymers may not be ideal for small-footprint devices.…”

Section: Introductionmentioning

confidence: 99%

Low Loss Vertical TiO2/Polymer Hybrid Nano-Waveguides

et al. 2023

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This article proposes a novel demonstration of a low-loss polymer channel hybridized with a titania core leading to a nano-waveguide elongated in the normal direction to the substrate. It is aimed at using the quasi-transverse magnetic (TM) mode as the predominant mode in compact photonic circuitry. A detailed design analysis shows how a thin layer of a higher-refractive index material in a trench within the core of the waveguide can increase the confinement and reduce the propagation losses. This thin layer, produced by atomic layer deposition, covers the entire polymer structure in a conformal manner, ensuring both a reduction of the surface roughness and a stronger field confinement. The trench can be made at any place within the polymer channel and therefore its position can be tuned to obtain asymmetric modal distribution. The waveguide is demonstrated at telecom wavelengths, although the material’s properties enable operation over a large part of the electromagnetic spectrum. We measured propagation losses as low as 1.75 ± 0.32 dB/cm in a 200 nm × 900 nm section of the waveguide core. All processes being mass-production compatible, this study opens a path towards easier integrated-component manufacture.

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confidence: 99%

“…Nanocomposites for electronics and nanofabrication are considered in [ 3 , 4 ]. In [ 3 ], an innovative resist based on CuO/polymethyl methacrylate (PMMA) is developed; the CuO nanostructures with typical sizes of 10–30 nm provide functionality to the resist, which can be patterned by electron beam lithography. [ 4 ] reviews the dielectric-thickness dependence of the electric breakdown strength, which is a critical parameter in the design of solid insulation structures, discussing the responsible mechanisms for the thickness effect.…”

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confidence: 99%