2015
DOI: 10.1016/j.mssp.2015.05.043
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Current–voltage and capacitance–voltage characteristics of Al Schottky contacts to strained Si-on-insulator in the wide temperature range

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Cited by 41 publications
(7 citation statements)
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“…Current increases in both devices with applied bias. The barrier distribution deformation under applied bias was identified by contacting the abrupt Schottky's ideality coefficient [ 15 ]. The reverse current was comparatively higher in thicker epitaxial layers.…”
Section: Resultsmentioning
confidence: 99%
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“…Current increases in both devices with applied bias. The barrier distribution deformation under applied bias was identified by contacting the abrupt Schottky's ideality coefficient [ 15 ]. The reverse current was comparatively higher in thicker epitaxial layers.…”
Section: Resultsmentioning
confidence: 99%
“…Table 4. The tunneling probability (E 00 ) as calculated from equation [15] for doing concentration of 2 Â 10 16 cm À3 and the electron effective mass as well as the dielectric constant as extracted from the simulation program [34]. E 00 (eV) 0.0252…”
Section: Declarationsmentioning
confidence: 99%
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“…One conventional method to estimate the SBH is via the measurement of current-voltage and temperature (I-V-T). This conventional method to find out this important term is by injecting each data pair (T 0 , I s ) into the following equation, [1][2][3][4][5]…”
mentioning
confidence: 99%
“…Therefore, there was a temperature-dependent barrier height in many references. [1][2][3][4][5][6][7][8] The barrier height is considerably dependent on the temperature because of the method to use Richardson-Dushman's formula. As one can see in references, the values of j increase with increasing temperature, 9-14 however, as the temperature increases, the barrier height of GaAs/Cr and Pd/n-GaSb starts to decrease.…”
mentioning
confidence: 99%