We developed a new
technique to fabricate single nanowire devices
with reliable graphene/nanowire contacts using a position-controlled
microtransfer and an embedded nanowire structure in a planar junction
configuration. A thorough study of electrical properties and fabrication
challenges of single p-GaAs nanowire/graphene devices was carried
out in two different device configurations: (1) a graphene bottom-contact
device where the nanowire–graphene contact junction is formed
by transferring a nanowire on top of graphene and (2) a graphene top-contact
device where the nanowire–graphene contact junction is formed
by transferring graphene on top of an embedded nanowire. For the graphene
top-contact devices, graphene–nanowire–metal devices,
where graphene is used as one electrode and metal is the other electrode
to a nanowire, and graphene–nanowire–graphene devices,
where both electrodes to a nanowire are graphene, were investigated
and compared with conventional metal/p-GaAs nanowire devices. Conventional
metal/p-GaAs nanowire contact devices were further investigated in
embedded and nonembedded nanowire device configurations. A significantly
improved current in the embedded device configuration is explained
with a “parallel resistors model” where the high-resistance
parts with the metal–semiconductor Schottky contact and the
low-resistance parts with noncontacted facets of the hexagonal nanowires
are taken into consideration. Consistently, the nonembedded nanowire
structure is found to be depleted much easier than the embedded nanowires
from which an estimation for a fully depleted condition has also been
established.