Thin Solid Films
 1995
DOI: 10.1016/0040-6090(95)06541-5
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Cyclic alkylsilanes as low-pressure chemical vapor deposition silicon dioxide precursors

Ravi Kumar Laxman1,
Arthur K. Hochberg2,
Hansong Cheng
3
et al.
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Cited by 3 publications
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Thin‐Film Deposition Materials

Misra
1
,
Hogan
2
,
Chorush3
2002
Handbook of Chemicals and Gases for the Semiconductor Industry
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Thin‐Film Deposition Materials

Misra
1
,
Hogan
2
,
Chorush3
2002
Handbook of Chemicals and Gases for the Semiconductor Industry
0
0
0
0
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Structural studies of 20 keV oxygen-implanted silicon

Gupta
1
,
Yadav
2
,
Rao
3
et al. 2000
Nuclear Instruments and Methods in Physics Research Section B:
9
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4
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Characterization of bis(tertiary-butylamino)silane-based low-pressure chemical vapor deposition silicate glass films

Park
1
,
Conti
2
,
Economikos
3
et al. 2001
Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
5
1
3
0
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