Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas

Dzioba, Steven; Este, G.; Naguib, H. M.

doi:10.1149/1.2123601

Cited by 65 publications

(29 citation statements)

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“…The degradation rates increase linearly with the applied power (P,) in both an oxygen and an argon plasma in agreement with those observed for many other polymers, 33,36,37 but extrapolation of these straight lines at P, = 0 do not go through zero. Then, the degradation rates versus power can be expressed by the following equation:…”

Section: Degradationsupporting

confidence: 86%

Interactions of polymer model surfaces with cold plasmas: Hexatriacontane as a model molecule of high‐density polyethylene and octadecyl octadecanoate as a model of polyester. I. Degradation rate versus time and power

Clouet

Shi

1992

J of Applied Polymer Sci

100

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SYNOPSISTo gain a better understanding of the evolution of polymer surfaces under cold plasmas, model polymer surfaces were studied. The degradation products and the gas phase were investigated by mass and optical emission spectrometry. Their evolution versus time and power enable us to propose a mechanism that involves atomic oxygen, OH' and H' radicals. I NTRO DUCT10 N Low-temperature plasmas have been widely used to improve polymer surface properties 1-7 by introducing new functional These treatments lead to the formation of radicals that are, very likely, the promoters of surface cr~sslinking,~'-~~ functionalization, and d e g r a d a t i~n . *~-~~ The modification is the result of different plasma species such as ions, excited neutrals, as well as UV radiation. Therefore, it is very difficult to establish a relationship between these species and the relevant mechanisms. Moreover, polymer surfaces are very often poorly defined because of the presence of initiators and different additives: It can thus be difficult to pinpoint the origin of the modification observed. In order to simplify these systems, we decided to study model polymer surface^.^^,^^ Our goal is to establish a relationship between the physical and the chemical makeup of a polymer and its behavior in cold plasmas. Our strategy is based on the understanding of the surface modification of a very simple model whose chemical structure and morphology are well defined and that of the same model after its endowment with a chemical function. Hexatriacontane ( C36H74), which is known to share many structural features with highdensity polyethylene, has often been chosen as a model of this polymer. Crystallization of this pure * To whom correspondence should be addressed.Journal of Applied Polymer Science, Vol. 46, 1955-1966 (1992 crystallizes also in lozenge-shaped tablets as shown in Figure 1. In a first step, we have determined the effect of the presence of an ester function by comparing the behavior of C36H74 and OOD under plasma. In a second step, the model molecules have been compared with their corresponding polymers, that is, high-density polyethylene (cristallinity > 90% ) and polycaprolactone -[ (CH2)&02 In-(cristallinity N 55% ), respectively, in order to exemplify the role of the molecular weight of the amorphous domains and the chain ends. This will be the purpose of our next paper. The cold plasma treatment leads to bond breaking on the polymer surface; the fragments formed are kicked out into the gas phase and can be analyzed by mass spectrometry and optical emission spectroscopy. In this study, we report the influence of the plasma parameters (time, power) investigated in terms of ( a ) weight loss both on the parafinic model and on the ester, ( b ) concentration of the small molecules in the effluents originating from surface degradation, and (c ) emission intensities of the excited species. 1955

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Section: Degradationsupporting

confidence: 86%

Interactions of polymer model surfaces with cold plasmas: Hexatriacontane as a model molecule of high‐density polyethylene and octadecyl octadecanoate as a model of polyester. I. Degradation rate versus time and power

Clouet

Shi

1992

J of Applied Polymer Sci

100

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“…Kimura et al [10] and Carl et al [11] reported that highly exited O and O þ 2 exist in the plasma. Dzioba et al [12] also observed not only O and O þ 2 but also O þ . From these reports, it is supposed that the positive ions (O þ 2 or O þ ) created in the plasma region and then the positive ions existed in the bulk of the oxide prepare by ECR method.…”

Section: Discussionmentioning

confidence: 91%

Low SiO2/Si interface state density for low temperature oxides prepared by electron cyclotron resonance oxygen plasma

Kang

2003

Journal of Non-Crystalline Solids

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“…In either case, the photoresist was likely to be subjected to the particles and radiation present in the discharge, both of which can assist in the oxidation of the material since it has an activation energy in the neighborhood of 0.5 eV (3,11). However, in our case, as in others (9,10,12), the circuits to be cleaned are separated from the environment of the discharge. This not only removes the materials from the possibly harmful effects of the discharge, but also allows better control of the process parameters owing to a better understanding of the various phenomena involved in the downstream reactions.…”

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confidence: 73%

Oxidative Removal of Photoresist by Oxygen/Freon® 116 Discharge Products

Hannon

Cook

1984

J. Electrochem. Soc.

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Microwave discharge products of a few percent of C2F6 in 02 have been used for the study of the removal of Shipley AZ 1350J photoresist as a function of time and temperature. The removal rate was found to increase with increasing C~F6 concentration. The activation energy of removal has been determined for C~F6 concentrations ranging from 0.048 to 0.81 volume percent. Initially, the activation energy decreases rapidly to 0.34 eV for C2F6 concentrations ranging from 0.048% to 0.10% and continues to decrease with increasing C2F6 concentrations to approximately 0.16 eV at 0.81% C2F6. The results reported apply to the removal of Shipley AZ 1350J photoresist, but are likely to indicate the oxidative-removal trends of other organic residues.

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Decapsulation and Photoresist Stripping in Oxygen Microwave Plasmas

Cited by 65 publications

References 1 publication

Interactions of polymer model surfaces with cold plasmas: Hexatriacontane as a model molecule of high‐density polyethylene and octadecyl octadecanoate as a model of polyester. I. Degradation rate versus time and power

Interactions of polymer model surfaces with cold plasmas: Hexatriacontane as a model molecule of high‐density polyethylene and octadecyl octadecanoate as a model of polyester. I. Degradation rate versus time and power

Low SiO2/Si interface state density for low temperature oxides prepared by electron cyclotron resonance oxygen plasma

Oxidative Removal of Photoresist by Oxygen/Freon® 116 Discharge Products

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