Decorative hard coatings: new layer systems without allergy risk

Beck, Uwe; Reiners, G.; Urban, I.; Jehn, Hermann; Kopacz, Uwe; Schack, H.

doi:10.1016/0257-8972(93)90228-g

Cited by 31 publications

(9 citation statements)

References 2 publications

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“…Zhang et al [16] studied corrosion behavior of the film and reported that the chemical inertness could be improved by the additions of Zr into CrN material. Moreover, there are some researches on film color modification by means of stoichiometry and structure adjustments [17][18][19].…”

Section: Introductionmentioning

confidence: 99%

Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents

et al. 2015

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Section: Introductionmentioning

confidence: 99%

Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents

et al. 2015

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“…Among these, zirconium nitride (ZrN) has been extensively studied owing to its excellent physicomechanical and tribological properties [ 14 , 15 ]. For instance, ZrN possesses high hardness, good electrical conductivity and low chemical reactivity [ 16 ], and has been used as wear resistant coatings on cutting tools [ 17 ], and as decorative films for scratch resistance and colouring in the jewellery industry [ 18 ]. Thin films of ZrN have also been used as diffusion barriers in integrated circuits [ 19 ].…”

Section: Introductionmentioning

confidence: 99%

Atom economy and green elimination of nitric oxide using ZrN powders

et al. 2018

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Nitric oxide (NO) may cause serious environmental problems, such as acid rain, haze weather, global warming and even death. Herein, a new low-cost, highly efficient and green method for the elimination of NO using zirconium nitride (ZrN) is reported for the first time, which does not produce any waste or any by-product. Relevant experimental parameters, such as reaction temperature and gas concentration, were investigated to explore the reaction mechanism. Interestingly, NO can be easily decomposed into nitrogen (N2) by ZrN powders at 600°C with ZrN simultaneously transformed into zirconium dioxide (ZrO2) gradually. The time for the complete conversion of NO into N2 was approximately 14 h over 0.5 g of ZrN at a NO concentration of 500 ppm. This green elimination process of NO demonstrated good atom economy and practical significance in mitigating environmental problems.

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“…Zirconium Nitride (ZrN) thin¯lm is the generally attractive ceramic material widely used in hard coating applications such as protective coatings, 4 thermal insulation coating, cryogenic thermometers, 5 Josephson junction, di®usion barrier, 6 cutting tools and as decorative coating in jewelry industries. 7 Micro scale Zirconium Nitride thin¯lms can be developed by many techniques such as vacuum arc evaporation, 8 sputtering 4 chemical vapor deposition, 9 etc., but the properties of the prepared lms greatly in°uence the method of preparation and the growth parameters. Moreover, if the deposition process results in porous¯lms, the properties of thē lms will get a®ected.…”

Section: Introductionmentioning

confidence: 99%

Effect of Substrate Bias Voltage on the Physical Properties of Zirconium Nitride (ZrN) Films Deposited by Mid Frequency Reactive Magnetron Sputtering

Kavitha

Kannan

Loganathan³

2014

Int. J. Nanosci.

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Present work involves the preparation of Zirconium Nitride thin¯lms on stainless steel (SS) (304L grade) substrate by reactive cylindrical magnetron sputtering method. The X-ray di®raction (XRD) pro¯le of the ZrN thin¯lms prepared with di®erent bias voltage conforms face centered cubic structure with preferred orientation along the (111) plane at lower bias voltage (100 V) and at higher bias voltage (300 V) the preferred orientation shifted to (220) plane. The in°uences of bias voltage on the thickness and microhardness ZrN thin¯lms have been studied. ZrN thin¯lm sputtered with 300 V bias voltage shows the maximum re°ectance of 90% at a wavelength of 1000 nm. The coated substrates have been found to exhibit improved corrosion resistance compared to the SS plate. The root mean square surface roughness and surface morphology were investigated from 3D atomic force microscope (AFM) images and scanning electron microscope (SEM), which indicate smooth and uniform surface pattern without any pin holes.

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Decorative hard coatings: new layer systems without allergy risk

Cited by 31 publications

References 2 publications

Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents

Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents

Atom economy and green elimination of nitric oxide using ZrN powders

Effect of Substrate Bias Voltage on the Physical Properties of Zirconium Nitride (ZrN) Films Deposited by Mid Frequency Reactive Magnetron Sputtering

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