2013
DOI: 10.1063/1.4821454
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Defect recombination induced by density-activated carrier diffusion in nonpolar InGaN quantum wells

Abstract: Abstract:We report on the observation of carrier-diffusion-induced defect emission at high excitation density in a-plane InGaN single quantum wells. When increasing excitation density in a relatively high regime, we observed the emergence of defect-related emission together with a significant reduction in bandedge emission efficiency. The experimental results can be well explained with the density-activated carrier diffusion from localized states to defect states. Such a scenario of density-activated defect re… Show more

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Cited by 5 publications
(13 citation statements)
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“…Likewise, upon the dynamic study of three components TiO 2 -Au-CdS, the Au NPs not only served as an electron relay of charge carriers between CdS and TiO 2 , but also acted as a plasmonic photosensitizer to inject electron into TiO 2 to improve solar-to-chemical energy conversion efficiency 35 The SEM image in Figure 1(a) shows uniform arrays of as-grown p-type InGaN/GaN multiband NWs on Si (111) substrate with an average height of ~600 nm, and diameter of ~40-100 nm. Figure 1 37,38 , which is in good agreement with the defect (or yellow) emission from surface and interface defects along the growth axis of InGaN/GaN NWs reported previously [39][40][41][42] . The PLE spectrum of InGaN/GaN NWs shows strong absorption from 350-450 nm, consistent with previous reports 15,39 .…”
supporting
confidence: 90%
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“…Likewise, upon the dynamic study of three components TiO 2 -Au-CdS, the Au NPs not only served as an electron relay of charge carriers between CdS and TiO 2 , but also acted as a plasmonic photosensitizer to inject electron into TiO 2 to improve solar-to-chemical energy conversion efficiency 35 The SEM image in Figure 1(a) shows uniform arrays of as-grown p-type InGaN/GaN multiband NWs on Si (111) substrate with an average height of ~600 nm, and diameter of ~40-100 nm. Figure 1 37,38 , which is in good agreement with the defect (or yellow) emission from surface and interface defects along the growth axis of InGaN/GaN NWs reported previously [39][40][41][42] . The PLE spectrum of InGaN/GaN NWs shows strong absorption from 350-450 nm, consistent with previous reports 15,39 .…”
supporting
confidence: 90%
“…Figure 1 37,38 , which is in good agreement with the defect (or yellow) emission from surface and interface defects along the growth axis of InGaN/GaN NWs reported previously [39][40][41][42] . The PLE spectrum of InGaN/GaN NWs shows strong absorption from 350-450 nm, consistent with previous reports 15,39 . The absorption features from 350-375 nm and 375-450 nm can be assigned as the electronic transition from VB to CB of the GaN (~3.4 eV) and the InGaN segments, respectively.…”
supporting
confidence: 90%
“…5(a), a broadband yellow defect emission together with blue bandedge emission can be detected from the a-plane QW samples under relatively intense pulse excitation [15]. When increasing excitation fluence, the defect emission becomes more important.…”
Section: Efficiency Droopmentioning
confidence: 97%
“…Many factors have been proposed to explain this phenomenon including current leakage, Auger recombination and defect-related mechanisms [14][15][16][17][19][20][21][22][23][24][25][26][27][28][29][30][31]. Vital progresses have been made on suppressing the efficiency droop in the past few years [16,17,20,26,[28][29][30]66].…”
Section: Efficiency Droopmentioning
confidence: 99%
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