Degradation of organic silane monolayers on silicon wafer during XPS measurement

Abstract

The degradation of organic materials was often observed during XPS measurement. We have evaluated the degradation of silicon wafers modified with 3,3,3-trifluoropropyltrimethoxysilane (F3PTMS-Si), 3-chloropropyltriethoxysilane (CPTES-Si), 3-bromopropyltrimethoxysilane (BPTMS-Si) and 3-iodopropyltrimethoxysilane (IPTMS-Si), and gold substrate modified with 1H,1H,2H,2H-perfluorodecanthiol (PFDT-Au) as reference material in order to investigate influence of C-F, C-Cl, C-Br and C-I bonds in the organic silane monolayers. As a result, the order of damaging factor, β, was IPTMS-Si > BPTMS-Si > CPTES-Si > F3PTMS-Si. It was found that the value of β was related to the chemical bond energy of C-X(X=F, Cl, Br, I).

Nitinol Modified by In Situ Generated Diazonium from Its Nitro Precursor for the SI-ATRP of 2-Hydroxyethyl Methacrylate

“…The presence of N is characteristic of a partial dediazotation during the PD-Br electrografting. Nevertheless, dediazotation occurs during the electrografting as shown by the Br/(NH 2 +NH 3 + ) ratio, which is probably under-estimated due to the degradation of C-Br bond under X-Ray radiation, 96 but still higher than 0.5 (which is the ratio if PD-Br remains in its diazonium form), corroborating the hypothesis of C-O-Ti bond formation between the grafted layer and the NiTi surface. The presence of Ti oxides as main constituent of the NiTi surface is highlighted by the Ti/(Ni+Ti) ratio (0.72) and better it has been strengthened after the diazonium grafting.…”