A CFD–DEM
coupling model was applied to the silicon production by silane chemical
vapor deposition in a spouted bed to investigate local phase movements,
mass transfer, heat transfer, and the deposition rate of silicon.
Silicon particle growth by heterogeneous deposition on the seed particle
and fines formation in the gas phase were included. In addition, the
scavenging effect was also considered in the particle growth mechanism.
The spouted bed has advantages to promote heterogeneous deposition
time due to a larger solid holdup and higher gas residence time in
the annulus region. Furthermore, the effects of operating conditions,
i.e., inlet gas temperature, silane composition, and gas velocity,
on the reactor performance were investigated in detail, and some guidelines
are provided for the choice of operating conditions. Verification
of solid movement results with the experimental data and correlations
show good agreement. In addition, the axial profile of bed voidage
agrees well with correlation.