We
study the electronic structure and local pressure of Al/crystal-SiO2 (Al/c-SiO2) and Al/amorphous-SiO2 (Al/a-SiO2) interface systems in the presence of oxygen vacancy. In
this modeled nanodevice, we created an oxygen vacancy at different
sites from the interface to the quasi-bulk SiO2 region
in both neutral and charged Al/SiO2 systems. We found that
oxygen vacancies close to the interface do not change the band offset
or electronic structures. However, oxygen vacancies far away from
the interface generate shallow hole trapping states. We also applied
the quantum stress density theory to calculate the local hydraulic
pressure around each host oxygen atom to be removed for creating an
oxygen vacancy. We found a correlation between vacancy formation energy
and the oxygen local pressure, which is consistent with the previous
study in the bulk a-SiO2. We also found that oxygen atoms
close to the interface have ∼0.9 eV lower formation energy
and lower local pressure. In addition, charges (−1 e and +1
e) have been introduced to Al/SiO2 systems in the presence
of oxygen vacancies to study the doping effect on the electronic structures.
It shows that charging the Al/SiO2 systems varies the Fermi
energy level and reduces the potential barrier height of the charge
carriers, hence decreasing the oxide dielectric strength. We further
explore the relation between electron hopping integrals and the oxygen
vacancies in the charged systems. Our result shows that the hopping
integrals increase significantly when their hopping paths are closer
to the oxygen vacancies, e.g., the higher the hopping integral, the
higher the formation energy of vacancies, which also correspond to
lower local pressure around the removed oxygen atoms. Our data also
suggest strong correlations among local pressure, vacancy formation
energy, electronic potential barrier height, and electronic hopping
integrals, providing a unique yet comprehensive understanding of electronic
properties on the metal/oxide interface. Our research represents an
important milestone in the ultimate goal of an advanced understanding
of dielectric breakdown.