2010 Proceedings of the European Solid State Device Research Conference 2010
DOI: 10.1109/essderc.2010.5618197
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Dependence of the switching characteristics of resistance random access memory on the type of transition metal oxide

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Cited by 17 publications
(9 citation statements)
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“…For the OxRAM memory elements addressed in this paper, the MIM structure is generally composed of metallic electrodes sandwiching an active layer, usually an oxygen-deficient oxide. A large number of resistive switching oxides, like HfO 2 , Ta 2 O 5 , NiO, TiO 2 or Cu 2 O, are reported in the literature [7][8][9][10]. The Valency Change Mechanism (VCM) occurs in specific transition metal oxides and is triggered by a migration of anions, such as oxygen vacancies.…”
Section: Introductionmentioning
confidence: 99%
“…For the OxRAM memory elements addressed in this paper, the MIM structure is generally composed of metallic electrodes sandwiching an active layer, usually an oxygen-deficient oxide. A large number of resistive switching oxides, like HfO 2 , Ta 2 O 5 , NiO, TiO 2 or Cu 2 O, are reported in the literature [7][8][9][10]. The Valency Change Mechanism (VCM) occurs in specific transition metal oxides and is triggered by a migration of anions, such as oxygen vacancies.…”
Section: Introductionmentioning
confidence: 99%
“…A large number of oxide-based materials showing a resistive switching are repOIied in the literature [21][22][23]. Among them, metal oxides like Hf02, Ta20S, NiO, Ti02 or CU20 are promising candidates due their compatibility with CMOS processes and high on/off resistance ratio.…”
Section: B Oxrram Technology Principlementioning
confidence: 99%
“…A plethora of transition metal oxides (TMO) have been reported [23][24][25] to exhibit stable resistive switching behavior. TMO sandwiched between active (Top) and passive (Bottom) metal electrodes broadly form the device composition, which can take the place of a 'Via' in the Back-end-of-Line (BEOL) of standard CMOS process as shown in Fig.…”
Section: ) Oxrram Technologymentioning
confidence: 99%