“…According to the conventional equation μ = ( L / W )( d / ε 0 ε r V ds )(Δ I ds /Δ V bg ), where μ is the field‐effect mobility, L / W is the channel length‐to‐width ratio and is 1 for this study, ε 0 is the permittivity in vacuum, ε r is 3.9 for SiO 2 , and d is the thickness of the dielectric layer (285 nm), we obtained mobilities of 0.03 and 0.30 cm 2 V −1 s −1 , extracted at V ds = 10 V in the high V bg region, for electrons and holes, respectively. Both mobilities were much lower than the theoretical prediction in the literature, implying the existence of a large contact resistance in the layered MoTe 2 transistors.…”