In this work, we report the characterization of Spin-On Glass (SOG) as low temperature gate insulator. The SOG film was deposited at a temperature of 200°C, which is compatible to use on flexible substrates. The optical and electrical characterization showed that the refractive index and dielectric constant are very close to those of thermally grown SiO 2 . We demonstrated the use of SOG as gate insulator, fabricating and characterizing a-SiGe:H TFTs.
Index Terms-Inverted staggered (IS), spin-on-glass (SOG), thin-film transistor (TFT).