Deposition and Characterization of Molybdenum Thin Film Using Direct Current Magnetron and Atomic Force Microscopy

Abstract

In this paper, pure molybdenum (Mo) thin film has been deposited on blank Si substrate by DC magnetron sputtering technique. The deposition condition for all samples has not been changed except for the deposition time in order to study the influence of time on the thickness and surface morphology of molybdenum thin film. The surface profiler has been used to measure the surface thickness. Atomic force microscopy technique was employed to investigate the roughness and grain structure of Mo thin film. The thickness and grain of molybdenum thin film layer has been found to increase with respect to time, while the surface roughness decreases. The average roughness, root mean square roughness, surface skewness, and surface kurtosis parameters are used to analyze the surface morphology of Mo thin film. Smooth surface has been observed. From grain analysis, a uniform grain distribution along the surface has been found. The obtained results allowed us to decide the optimal time to deposit molybdenum thin film layer of 20–100 nm thickness and subsequently patterned as electrodes (source/drain) in carbon nanotube-channel transistor.

A Parametric Three-Dimensional Phase-Field Study of the Physical Vapor Deposition Process of Metal Thin Films Aiming at Quantitative Simulations

“…Physical vapor deposition (PVD) is a well-known technology that is widely used for the deposition of various coatings including metal thin films, such as Mo and Cu thin films for microelectronic devices [1,2], Ti thin films for biomedical applications [3] and Zr thin films for nuclear industry [4], thermal barrier coatings for turbine engines [5][6][7], as well as wear and oxidation resistance coatings for machining tools [8,9]. In industry, the PVD coating properties significantly affecting the coated tool life can be tuned by applying different deposition parameters.…”

“…As is well known, the microstructure evolution during the PVD process plays an important role in the properties of coatings [18][19][20][21][22][23]. Therefore, it is necessary to perform quantitative descriptions of the microstructure evolution of coatings and establish the relationship between various process parameters and their microstructures during the PVD process in order to further design the coatings with higher quality.Up to now, various researchers have devoted themselves to experimental investigations of the effects of process parameters of PVD on the microstructure of coatings, conducting the corresponding microstructure characterization and preparing the coatings with significantly different microstructures by using different process parameters, such as the PVD chamber temperature, the substrate thickness, the substrate rotation, the incident vapor rate and angle, and the deposition time [2,5,24,25]. Typically, the experimental studies are time-consuming and costly, and computer simulations can help to realize the investigation on the microstructure of coatings during PVD.…”

“…Up to now, various researchers have devoted themselves to experimental investigations of the effects of process parameters of PVD on the microstructure of coatings, conducting the corresponding microstructure characterization and preparing the coatings with significantly different microstructures by using different process parameters, such as the PVD chamber temperature, the substrate thickness, the substrate rotation, the incident vapor rate and angle, and the deposition time [2,5,24,25]. Typically, the experimental studies are time-consuming and costly, and computer simulations can help to realize the investigation on the microstructure of coatings during PVD.…”

Effects of Annealing on Characteristics of Cu2ZnSnSe4/CH3NH3PbI3/ZnS/IZO Nanostructures for Enhanced Photovoltaic Solar Cells

“…The outward diffusion of selenium into Mo strongly depends on the annealing temperature [26]. The reconstructed interfacial layer significantly diminishes series-resistance and enlarges shunt-resistance of the solar cell.Aqil et al studied the electrical and morphological appearance of the functional portion of Mo film deposition [27]. A single layer of Mo film with low resistivity and good adhesion has been deposited successfully by the radio-frequency (RF) magnetron sputtering system using appropriate parameters.…”

“…Aqil et al studied the electrical and morphological appearance of the functional portion of Mo film deposition [27]. A single layer of Mo film with low resistivity and good adhesion has been deposited successfully by the radio-frequency (RF) magnetron sputtering system using appropriate parameters.…”